View source for 18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Inbeom Yim of Suwon-si (KR)|Inbeom Yim of Suwon-si (KR)]][[Category:Inbeom Yim of Suwon-si (KR)]]

[[:Category:Junseong Yoon of Suwon-si (KR)|Junseong Yoon of Suwon-si (KR)]][[Category:Junseong Yoon of Suwon-si (KR)]]

[[:Category:Seungyoon Lee of Suwon-si (KR)|Seungyoon Lee of Suwon-si (KR)]][[Category:Seungyoon Lee of Suwon-si (KR)]]

[[:Category:Jeongjin Lee of Suwon-si (KR)|Jeongjin Lee of Suwon-si (KR)]][[Category:Jeongjin Lee of Suwon-si (KR)]]

[[:Category:Chan Hwang of Suwon-si (KR)|Chan Hwang of Suwon-si (KR)]][[Category:Chan Hwang of Suwon-si (KR)]]

==MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18332238 titled 'MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS

==Simplified Explanation==

The method described in the patent application involves selecting multi-wavelengths for overlay measurement in semiconductor device manufacturing. The process includes measuring overlay at multiple positions on a wafer at different wavelengths within a specific range, selecting representative wavelengths that simulate the overlay, and assigning weights to these representative wavelengths.

* Explanation of the patent/innovation:
  * Method for selecting multi-wavelengths for overlay measurement in semiconductor device manufacturing.
  * Involves measuring overlay at various positions on a wafer at different wavelengths within a specific range.
  * Selecting representative wavelengths that simulate the overlay based on the measurements.
  * Assigning weights to the representative wavelengths for accurate overlay measurement.

== Potential Applications ==
This technology can be applied in various industries such as semiconductor manufacturing, optical metrology, and precision engineering where accurate overlay measurement is crucial.

== Problems Solved ==
* Accurate measurement of overlay in semiconductor device manufacturing.
* Improved precision in optical metrology.
* Enhanced quality control in precision engineering processes.

== Benefits ==
* Increased accuracy in overlay measurement.
* Better control over manufacturing processes.
* Enhanced product quality and reliability.

== Potential Commercial Applications ==
Optical metrology systems for semiconductor manufacturing
Precision engineering equipment for overlay measurement
Quality control systems for various industries

== Possible Prior Art ==
One possible prior art could be the use of single-wavelength overlay measurement techniques in semiconductor manufacturing processes. However, the innovation in this patent application lies in the selection and use of multi-wavelengths for overlay measurement, which can provide more accurate and reliable results.

=== Unanswered Questions ===

=== How does this method compare to traditional single-wavelength overlay measurement techniques? ===
The article does not provide a direct comparison between this method and traditional single-wavelength overlay measurement techniques. It would be interesting to know the specific advantages and limitations of using multi-wavelengths for overlay measurement in comparison to the traditional methods.

=== What are the specific industries or applications that can benefit the most from this technology? ===
While the article mentions potential applications in semiconductor manufacturing, optical metrology, and precision engineering, it does not delve into the specific industries or applications that can benefit the most from this technology. Understanding the targeted market segments can provide insights into the potential commercial success of this innovation.


==Original Abstract Submitted==

Provided are a method of selecting multi-wavelengths for overlay measurement, for accurately measuring overlay, and an overlay measurement method and a semiconductor device manufacturing method using the multi-wavelengths. The method of selecting multi-wavelengths for overlay measurement includes measuring an overlay at multiple positions on a wafer at each of a plurality of wavelengths within a set first wavelength range, selecting representative wavelengths that simulate the overlay of the plurality of wavelengths, from among the plurality of wavelengths, and allocating weights to the representative wavelengths, respectively.



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