18328818. METHODS FOR FORMING COATING FILMS AND SUBSTRATE PROCESSING APPARATUS INCLUDING PARTS MANUFACTURED BY SUCH METHODS simplified abstract (Samsung Electronics Co., Ltd.)

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METHODS FOR FORMING COATING FILMS AND SUBSTRATE PROCESSING APPARATUS INCLUDING PARTS MANUFACTURED BY SUCH METHODS

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Seungjun Lee of Seoul (KR)

Nongmoon Hwang of Seoul (KR)

METHODS FOR FORMING COATING FILMS AND SUBSTRATE PROCESSING APPARATUS INCLUDING PARTS MANUFACTURED BY SUCH METHODS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18328818 titled 'METHODS FOR FORMING COATING FILMS AND SUBSTRATE PROCESSING APPARATUS INCLUDING PARTS MANUFACTURED BY SUCH METHODS

Simplified Explanation

The patent application describes methods and apparatus for forming a coating film using an orthorhombic vernier phase rare-earth element oxyfluoride. The process involves providing a coating source containing the rare-earth element oxyfluoride and a part in a vacuum chamber, and then using a physical vapor deposition process to form the coating film on the part. The resulting coating film includes the orthorhombic vernier phase rare-earth element oxyfluoride.

  • The patent application describes a method of forming a coating film using an orthorhombic vernier phase rare-earth element oxyfluoride.
  • The method involves providing a coating source and a part in a vacuum chamber.
  • A physical vapor deposition process is then used to form the coating film on the part.
  • The resulting coating film contains the orthorhombic vernier phase rare-earth element oxyfluoride.

Potential applications of this technology:

  • This technology can be used in various industries that require high-performance coatings, such as aerospace, automotive, and electronics.
  • The coating film can provide enhanced protection against wear, corrosion, and oxidation.
  • It can also improve the surface properties of the part, such as hardness, smoothness, and adhesion.

Problems solved by this technology:

  • The use of the orthorhombic vernier phase rare-earth element oxyfluoride in the coating film can address the limitations of conventional coating materials.
  • It can provide improved performance and durability compared to traditional coatings.
  • The technology can also offer better control over the coating thickness and composition.

Benefits of this technology:

  • The coating film with the orthorhombic vernier phase rare-earth element oxyfluoride can enhance the lifespan and reliability of the coated parts.
  • It can reduce maintenance and replacement costs by providing superior protection against wear and corrosion.
  • The technology can enable the development of advanced coatings with tailored properties for specific applications.


Original Abstract Submitted

Provided herein are methods of forming a coating film that include providing a coating source including an orthorhombic vernier phase rare-earth element oxyfluoride and a part in a vacuum chamber, and performing a physical vapor deposition (PVD) process to form the coating film the part, wherein the coating film includes the orthorhombic vernier phase rare-earth element oxyfluoride. Apparatus including parts having coating films comprising an orthorhombic vernier phase rare-earth element oxyfluoride are also provided.

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