18317395. SEMICONDUCTOR MEASUREMENT APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

SEMICONDUCTOR MEASUREMENT APPARATUS

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Garam Choi of Suwon-si (KR)

Wookrae Kim of Suwon-si (KR)

Jinseob Kim of Suwon-si (KR)

Jinyong Kim of Suwon-si (KR)

Sungho Jang of Suwon-si (KR)

Younguk Jin of Suwon-si (KR)

Daehoon Han of Suwon-si (KR)

SEMICONDUCTOR MEASUREMENT APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18317395 titled 'SEMICONDUCTOR MEASUREMENT APPARATUS

Simplified Explanation

The semiconductor measurement apparatus described in the abstract utilizes an illumination unit, an image sensor, an optical unit, and a control unit to measure critical dimensions of structures in a sample based on interference patterns of polarization components of light.

• The apparatus includes an illumination unit that irradiates light to the sample.
• An image sensor receives light reflected from the sample and outputs multiple interference images representing interference patterns of polarization components of light.
• An optical unit, including an objective lens, is in the path through which the image sensor receives light.
• A control unit processes the multi-interference image to obtain measurement parameters determined from the polarization components at various azimuth angles on a plane perpendicular to the path of light incident to the image sensor.
• The control unit determines a selected critical dimension to be measured from a structure in the sample based on measurement parameters.
• The illumination unit and/or the optical unit may include a polarizer and a compensator with a ¼ wave plate.

---

1. 1. 1. Potential Applications

- Quality control in semiconductor manufacturing - Nanotechnology research and development

1. 1. 1. Problems Solved

- Accurate measurement of critical dimensions in semiconductor structures - Enhanced precision in semiconductor analysis

1. 1. 1. Benefits

- Improved quality control processes - Increased efficiency in semiconductor manufacturing - Enhanced research capabilities in nanotechnology

1. 1. 1. Potential Commercial Applications
         1. Semiconductor Quality Control and Analysis

- Optimizing semiconductor manufacturing processes - Ensuring product quality in semiconductor industry

1. 1. 1. Possible Prior Art

No prior art information is available at this time.

---

1. 1. 1. 1. Unanswered Questions

1. 1. 1. How does the apparatus handle variations in sample composition that may affect measurement accuracy?

The abstract does not provide details on how the apparatus compensates for sample composition variations that could impact measurement accuracy.

1. 1. 1. What is the potential impact of environmental factors on the measurement results obtained by the apparatus?

The abstract does not address how environmental factors such as temperature or humidity may influence the measurement results of the semiconductor structures.

Original Abstract Submitted

A semiconductor measurement apparatus may include an illumination unit configured to irradiate light to the sample, an image sensor configured to receive light reflected from the sample and output multiple interference images representing interference patterns of polarization components of light, an optical unit in a path through which the image sensor receives light and including an objective lens above the sample, and a control unit configured to obtain, by processing the multi-interference image, measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to a path of light incident to the image sensor. The control unit may be configured to determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters. The illumination unit and/or the optical unit may include a polarizer and a compensator having a ¼ wave plate.