18298031. METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

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METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Yu-Ching Chiu of Hsinchu City (TW)

Chih-Kuang Kao of Chu-pei City (TW)

Huei-Wen Yang of Hsinchu (TW)

METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING - A simplified explanation of the abstract

This abstract first appeared for US patent application 18298031 titled 'METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING

Simplified Explanation

The patent application describes an apparatus for observing a sample using a charged particle beam. The apparatus includes an ion beam column and an electron beam column, both of which generate and direct their respective beams. The sample is housed in a vacuum chamber, and a probe is positioned within the chamber to provide electrical connection between the sample and a power supply.

  • The apparatus includes an ion beam column and an electron beam column.
  • The ion beam column generates and directs an ion beam.
  • The electron beam column generates and directs an electron beam.
  • The sample is housed in a vacuum chamber.
  • A probe within the vacuum chamber provides electrical connection between the sample and a power supply.

Potential Applications:

  • Material analysis and characterization
  • Semiconductor device inspection
  • Biological sample imaging
  • Nanotechnology research

Problems Solved:

  • Enables high-resolution imaging of samples
  • Facilitates analysis of sample composition and structure
  • Allows for non-destructive testing of samples
  • Provides a means for studying nanoscale phenomena

Benefits:

  • High-resolution imaging capabilities
  • Versatile for various sample types
  • Non-destructive analysis
  • Enables detailed study of nanoscale features and properties


Original Abstract Submitted

An apparatus for observing a sample using a charged particle beam includes an ion beam column configured to generate and direct an ion beam, an electron beam column configured to generate and direct an electron beam, a vacuum chamber for housing the sample, and a probe positioned in the vacuum chamber. The probe is configured to provide electrical connection between the sample and a power supply.

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