18272859. DEFECT INSPECTION DEVICE simplified abstract (Hitachi High-Tech Corporation)
Contents
- 1 DEFECT INSPECTION DEVICE
DEFECT INSPECTION DEVICE
Organization Name
Inventor(s)
Hiromichi Yamakawa of Tokyo (JP)
Shunichi Matsumoto of Tokyo (JP)
DEFECT INSPECTION DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18272859 titled 'DEFECT INSPECTION DEVICE
Simplified Explanation
The patent application describes a defect inspection device with an inclined optical axis and imaging sensor for calculating height variation and focusing position deviation on a sample surface.
- Detection optical system with inclined optical axis
- Imaging sensor inclined with respect to the optical axis
- Calculation of height variation of illumination spot
- Calculation of deviation amount of focusing position
- Control of focus actuator based on deviation amount
- Addition of scattered light intensities at the same coordinates
Potential Applications
This technology can be applied in industries such as semiconductor manufacturing, quality control in production lines, and surface inspection in research and development.
Problems Solved
This technology solves the problem of accurately detecting defects on sample surfaces by calculating height variation and focusing position deviation, leading to improved inspection accuracy.
Benefits
The benefits of this technology include increased inspection accuracy, faster defect detection, and improved overall quality control processes in various industries.
Potential Commercial Applications
The potential commercial applications of this technology include defect inspection systems for semiconductor manufacturing, quality control devices for production lines, and surface inspection equipment for research and development laboratories.
Possible Prior Art
One possible prior art for this technology could be traditional defect inspection devices with fixed optical axes and imaging sensors, which may not provide accurate height variation calculations and focusing position deviations.
Unanswered Questions
How does this technology compare to traditional defect inspection devices in terms of accuracy and efficiency?
This article does not provide a direct comparison between this technology and traditional defect inspection devices in terms of accuracy and efficiency.
What are the specific industries or sectors that would benefit the most from implementing this defect inspection device?
This article does not specify the specific industries or sectors that would benefit the most from implementing this defect inspection device.
Original Abstract Submitted
A defect inspection device in which an optical axis of a detection optical system is inclined with respect to a surface of a sample, and an imaging sensor is inclined with respect to the optical axis, a height variation amount of an illumination spot in a normal direction of the surface of the sample is calculated based on an output of a height measuring unit, a deviation amount of the focusing position with respect to the light receiving surface in an optical axis direction of the detection optical system is calculated based on the height variation amount of the illumination spot, the deviation amount of the focusing position being generated accompanying a height variation of the illumination spot, and the focus actuator is controlled based on the deviation amount of the focusing position, and scattered light intensities at the same coordinates of the sample are added.
