18240007. SUBSTRATE PROCESSING APPARATUS AND METHOD simplified abstract (SEMES CO., LTD.)
Contents
- 1 SUBSTRATE PROCESSING APPARATUS AND METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SUBSTRATE PROCESSING APPARATUS AND METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
SUBSTRATE PROCESSING APPARATUS AND METHOD
Organization Name
Inventor(s)
Hyunjik Jung of Cheonan-si (KR)
Yong Won Kim of Cheonan-si (KR)
SUBSTRATE PROCESSING APPARATUS AND METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18240007 titled 'SUBSTRATE PROCESSING APPARATUS AND METHOD
Simplified Explanation
The substrate processing apparatus and method described in the patent application aim to prevent suction holes from being clogged due to airflow generated when a substrate is floated and printed. The apparatus includes a substrate stage for supporting the substrate and a treatment liquid ejection device mounted above the substrate stage to eject a treatment liquid onto the substrate. The substrate stage features a floating plate for floating at least a portion of the substrate and an airflow blocking member for blocking airflow flowing into the gap between the substrate and the floating plate.
- Substrate processing apparatus and method to prevent clogging of suction holes due to airflow during substrate floating and printing.
- Apparatus includes a substrate stage, treatment liquid ejection device, floating plate, and airflow blocking member.
- Floating plate supports the substrate while the airflow blocking member prevents airflow from entering the gap between the substrate and the floating plate.
Potential Applications
The technology can be applied in industries such as semiconductor manufacturing, display panel production, and printed electronics.
Problems Solved
Prevents clogging of suction holes during substrate processing, ensuring efficient and uninterrupted operation.
Benefits
Enhanced substrate processing efficiency, reduced maintenance requirements, and improved overall productivity.
Potential Commercial Applications
- Semiconductor manufacturing
- Display panel production
- Printed electronics
Possible Prior Art
There may be prior art related to substrate processing apparatus with floating plates, but specific examples are not provided in the patent application.
Unanswered Questions
How does the airflow blocking member effectively prevent clogging of suction holes?
The patent application mentions the airflow blocking member, but it does not detail the specific design or mechanism through which it achieves its intended purpose.
Are there any alternative methods to prevent clogging of suction holes during substrate processing?
The patent application focuses on the use of a floating plate and an airflow blocking member, but it does not explore other potential solutions or technologies that could address the same issue.
Original Abstract Submitted
Provided is a substrate processing apparatus and method capable of preventing suction holes from being clogged due to airflow generated when a substrate is floated and printed, and the substrate processing apparatus includes a substrate stage for supporting a substrate, and a treatment liquid ejection device mounted above the substrate stage to eject a treatment liquid onto the substrate, wherein the substrate stage includes a floating plate for floating at least a portion of the substrate, and an airflow blocking member for blocking at least a portion of a gap between the substrate and the floating plate to block airflow flowing into the gap.
