18223775. METHOD OF REMOVING AND COLLECTING PARTICLES FROM PHOTOMASK AND DEVICE FOR REMOVING AND COLLECTING PARTICLES THEREFROM simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 METHOD OF REMOVING AND COLLECTING PARTICLES FROM PHOTOMASK AND DEVICE FOR REMOVING AND COLLECTING PARTICLES THEREFROM
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 METHOD OF REMOVING AND COLLECTING PARTICLES FROM PHOTOMASK AND DEVICE FOR REMOVING AND COLLECTING PARTICLES THEREFROM - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
METHOD OF REMOVING AND COLLECTING PARTICLES FROM PHOTOMASK AND DEVICE FOR REMOVING AND COLLECTING PARTICLES THEREFROM
Organization Name
Inventor(s)
METHOD OF REMOVING AND COLLECTING PARTICLES FROM PHOTOMASK AND DEVICE FOR REMOVING AND COLLECTING PARTICLES THEREFROM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18223775 titled 'METHOD OF REMOVING AND COLLECTING PARTICLES FROM PHOTOMASK AND DEVICE FOR REMOVING AND COLLECTING PARTICLES THEREFROM
Simplified Explanation
The inventive concept provides a method of removing and collecting particles from a photomask including fabricating the photomask on a substrate, generating a first map indicating locations of particles on a surface of the photomask by inspecting the surface of the photomask using a probe tip, vertically moving the probe tip to a first vertical height that is lower than a height of the particle, horizontally moving the probe tip parallel to the surface of the photomask at the first vertical height, generating a second map indicating locations of particles on the surface of the photomask using the probe tip, vertically moving the probe tip to a second vertical height that is lower than the first vertical height, and horizontally moving the probe tip parallel to the surface of the photomask at the second vertical height.
- Method of removing and collecting particles from a photomask
- Fabricating the photomask on a substrate
- Generating maps indicating particle locations using a probe tip
- Vertically and horizontally moving the probe tip to target particles
Potential Applications
The technology can be applied in the semiconductor industry for improving the quality of photomasks used in manufacturing processes.
Problems Solved
This technology solves the problem of particle contamination on photomasks, which can lead to defects in the final products.
Benefits
The method allows for precise removal of particles from photomasks, ensuring high-quality output in semiconductor manufacturing.
Potential Commercial Applications
"Particle Removal Method for Photomasks in Semiconductor Manufacturing"
Possible Prior Art
There may be prior art related to methods of inspecting and cleaning photomasks in semiconductor manufacturing processes.
Unanswered Questions
How does this method compare to traditional particle removal techniques in terms of efficiency and effectiveness?
The article does not provide a direct comparison between this method and traditional particle removal techniques.
What are the potential limitations or challenges of implementing this technology in large-scale semiconductor manufacturing facilities?
The article does not address the potential limitations or challenges of implementing this technology on a large scale in semiconductor manufacturing facilities.
Original Abstract Submitted
The inventive concept provides a method of removing and collecting particles from a photomask including fabricating the photomask on a substrate, generating a first map indicating locations of particles on a surface of the photomask by inspecting the surface of the photomask using a probe tip, vertically moving the probe tip to a first vertical height that is lower than a height of the particle, horizontally moving the probe tip parallel to the surface of the photomask at the first vertical height, generating a second map indicating locations of particles on the surface of the photomask using the probe tip, vertically moving the probe tip to a second vertical height that is lower than the first vertical height, and horizontally moving the probe tip parallel to the surface of the photomask at the second vertical height.
