18184418. SEMICONDUCTOR PROCESS DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
SEMICONDUCTOR PROCESS DEVICE
Organization Name
Inventor(s)
Changsoon Lim of Suwon-si (KR)
Yongbeom Park of Suwon-si (KR)
SEMICONDUCTOR PROCESS DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18184418 titled 'SEMICONDUCTOR PROCESS DEVICE
Simplified Explanation
The patent application describes a semiconductor process device that includes a chamber housing with an internal region and multiple electrostatic chucks. The chamber housing has a window, and a light collection unit with two optical systems located at different positions on the window. There are multiple optical pickup units connected to each optical system. A sensor with multiple photodetectors converts the optical signals transmitted by the optical pickup units into electrical signals. A processor generates a spatial image of the internal region using the electrical signals and determines the location of an arc occurrence based on the spatial image.
- The semiconductor process device includes a chamber housing with electrostatic chucks and a light collection unit with multiple optical systems.
- Optical pickup units are connected to the optical systems to transmit optical signals.
- A sensor with photodetectors converts the optical signals into electrical signals.
- A processor generates a spatial image of the internal region and detects the location of an arc occurrence.
Potential applications of this technology:
- Semiconductor manufacturing processes
- Plasma processing chambers
- Wafer handling and inspection systems
Problems solved by this technology:
- Detection of arcing in the internal region of the chamber housing
- Monitoring and control of semiconductor processes
- Prevention of damage to semiconductor devices
Benefits of this technology:
- Improved safety by detecting and locating arcing events
- Enhanced process control and optimization
- Reduction in equipment downtime and maintenance costs
Original Abstract Submitted
A semiconductor process device includes a chamber housing defining an internal region and a plurality of electrostatic chucks within the internal region. The chamber housing includes a window, and a light collection unit including a first optical system and a second optical system located at different positions on the window. A plurality of first optical pickup units are connected to the first optical system, and a plurality of second optical pickup units are connected to the second optical system. A sensor includes a plurality of photodetectors that are configured to convert a first optical signal transmitted by the plurality of first optical pickup units and a second optical signal transmitted by the plurality of second optical pickup units into electrical signals. A processor is configured to generate a spatial image of the internal region of the chamber housing using the electrical signals output by the plurality of photodetectors, and determine a location at which an arc occurs in the internal region of the chamber housing based on the spatial image.
- SAMSUNG ELECTRONICS CO., LTD.
- Chansoo Kang of Suwon-si (KR)
- Daewon Kang of Suwon-si (KR)
- Sangki Nam of Suwon-si (KR)
- Jungmo Yang of Suwon-si (KR)
- Changsoon Lim of Suwon-si (KR)
- Sungho Jang of Suwon-si (KR)
- Jonghun Pi of Suwon-si (KR)
- Youngil Kang of Suwon-si (KR)
- Yoonjae Kim of Suwon-si (KR)
- Ilwoo Kim of Suwon-si (KR)
- Jongmu Kim of Suwon-si (KR)
- Yongbeom Park of Suwon-si (KR)
- H01L21/67
- H01J37/32