18164835. TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
Contents
- 1 TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS INCLUDING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS INCLUDING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Original Abstract Submitted
TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS INCLUDING THE SAME
Organization Name
Inventor(s)
Sunghyup Kim of Hwaseong-si (KR)
Jeonggil Kim of Hwaseong-si (KR)
Minseok Choi of Hwaseong-si (KR)
TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS INCLUDING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18164835 titled 'TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS INCLUDING THE SAME
Simplified Explanation
The patent application describes a target debris collection device for extreme ultraviolet (EUV) light source apparatus. The device includes a baffle body, a discharge plate, a guide structure, and a heating member.
- The baffle body is positioned within the EUV vessel and allows EUV light reflected from the collector to pass through its internal transmissive region.
- The discharge plate is located near the collector and collects the target material debris on its inner surface.
- The guide structure directs the collected debris from the discharge plate to a collection tank.
- A heating member is incorporated in the guide structure to prevent the target material debris from solidifying.
Potential Applications
- This technology can be used in extreme ultraviolet (EUV) light source apparatus, which are commonly used in semiconductor manufacturing and lithography processes.
Problems Solved
- The target material debris generated during the operation of EUV light source apparatus can cause contamination and reduce the efficiency of the system.
- The device solves the problem of collecting and removing the target material debris from the EUV vessel, preventing it from affecting the performance of the apparatus.
Benefits
- The baffle body and discharge plate effectively collect the target material debris, preventing it from spreading and contaminating the EUV vessel.
- The guide structure ensures that the collected debris is directed to a collection tank, facilitating easy removal and disposal.
- The heating member prevents the target material debris from solidifying, making it easier to handle and clean the device.
Original Abstract Submitted
A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.
