18154990. SEMICONDUCTOR MEASUREMENT APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
Contents
SEMICONDUCTOR MEASUREMENT APPARATUS
Organization Name
Inventor(s)
SEMICONDUCTOR MEASUREMENT APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18154990 titled 'SEMICONDUCTOR MEASUREMENT APPARATUS
Simplified Explanation
The semiconductor measurement apparatus described in the patent application includes an illumination unit, a light receiving unit, an image sensor, and a control unit.
- The illumination unit consists of a light source and at least one illumination polarization element.
- The light receiving unit includes at least one light-receiving polarization element placed on the path of light reflected by a sample.
- The image sensor is positioned to receive light passing through the light-receiving polarization element and produces an original image.
- The control unit processes the original image to determine a selected critical dimension of a structure in the sample.
The control unit performs the following steps:
- It obtains multiple sample images by selecting regions of the original image where an interference peak is present.
- It determines multiple elements of a Mueller matrix using the multiple sample images.
- It determines the selected critical dimension based on the multiple elements of the Mueller matrix.
Potential applications of this technology:
- Semiconductor manufacturing: The apparatus can be used to measure critical dimensions of structures in semiconductor devices, ensuring their quality and performance.
- Quality control: It can be employed in various industries to measure and analyze the dimensions of different structures, ensuring product quality and consistency.
Problems solved by this technology:
- Accurate measurement: The apparatus provides a reliable and precise method for determining critical dimensions of structures in samples, overcoming the limitations of traditional measurement techniques.
- Interference peak detection: By selecting regions with interference peaks, the apparatus can effectively identify the areas of interest for measurement, improving efficiency and accuracy.
Benefits of this technology:
- High precision: The use of polarization elements and the analysis of multiple sample images enable accurate measurement of critical dimensions.
- Efficiency: The apparatus can quickly process the original image and determine the selected critical dimension, reducing measurement time and increasing productivity.
- Versatility: The technology can be applied to various samples and structures, making it suitable for a wide range of industries and applications.
Original Abstract Submitted
A semiconductor measurement apparatus includes an illumination unit including a light source and at least one illumination polarization element, a light receiving unit including at least one light-receiving polarization element disposed on a path of light reflected by a sample, and an image sensor positioned to receive light passing through the at least one light-receiving polarization element and configured to output an original image, and a control unit configured to determine, by processing the original image, a selected critical dimension among critical dimensions of a structure included in a region of the sample. The control unit is configured to obtain a plurality of sample images by selecting regions of the original image in which a peak due to interference appears, to determine a plurality of elements included in a Mueller matrix using the plurality of sample images, and to determine the selected critical dimension based on the plurality of elements.
