18152726. INDUCTOR AND METHOD OF FORMING THE SAME simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

From WikiPatents
Jump to navigation Jump to search

INDUCTOR AND METHOD OF FORMING THE SAME

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor(s)

Po-Sheng Lu of Hsinchu City (TW)

Chien-Hung Liu of Hsinchu County (TW)

Nuo Xu of San Jose CA (US)

INDUCTOR AND METHOD OF FORMING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18152726 titled 'INDUCTOR AND METHOD OF FORMING THE SAME

Simplified Explanation

The inductor described in the abstract is a patterned wire structure consisting of a conductive core, a dielectric film, and a magnetic shell. The conductive core has a pair of end surfaces and an outer surface covered by the dielectric film, which is then covered by the magnetic shell.

  • The inductor includes a patterned wire structure with a conductive core, dielectric film, and magnetic shell.
  • The conductive core has end surfaces and an outer surface covered by the dielectric film.
  • The magnetic shell covers the dielectric film, with the dielectric film acting as a barrier between the core and the shell.

Potential Applications

The technology described in this patent application could be used in various electronic devices and systems that require inductors, such as power supplies, filters, and RF circuits.

Problems Solved

This technology solves the problem of efficiently integrating a dielectric film into an inductor design, providing improved performance and reliability compared to traditional inductors.

Benefits

The benefits of this technology include enhanced inductor performance, increased reliability, and potentially reduced size and weight of electronic devices due to the compact design.

Potential Commercial Applications

The technology could be applied in industries such as telecommunications, automotive, consumer electronics, and medical devices. A potential SEO-optimized title for this section could be "Commercial Applications of Patterned Wire Inductor Technology".

Possible Prior Art

One possible prior art for this technology could be the use of multilayer inductors in electronic devices, where dielectric films are used to separate conductive layers. However, the specific design of the patterned wire structure described in this patent application may be a novel improvement over existing technologies.

Unanswered Questions

How does the patterned wire structure affect the inductor's performance compared to traditional designs?

The article does not provide specific details on how the patterned wire structure impacts the inductor's performance in terms of efficiency, inductance, or other key parameters.

What manufacturing processes are required to produce the patterned wire structure inductors?

The article does not mention the specific manufacturing techniques or processes needed to fabricate the patterned wire structure inductors, which could be crucial information for potential commercialization.


Original Abstract Submitted

An inductor and a method of forming the same are provided. The inductor includes a patterned wire structure. The patterned wire structure includes a conductive core, a dielectric film and a magnetic shell. The conductive core includes a pair of end surfaces and an outer surface between the pair of end surfaces. The dielectric film covers the outer surface. The magnetic shell covers the dielectric film. The dielectric film is between the conductive core and the magnetic shell.