18046495. CATALYTIC DECOMPOSITION DEVICE AND INTEGRATED WASTE GAS TREATMENT SYSTEM simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

CATALYTIC DECOMPOSITION DEVICE AND INTEGRATED WASTE GAS TREATMENT SYSTEM

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Kyeongmin Baek of Hwaseong-si (KR)

Sungmin Jang of Suwon-si (KR)

Seongkeun Kang of Hwaseong-si (KR)

Taehyun Kim of Asan-si (KR)

Seongyun Ryu of Asan-si (KR)

Byungku Yoo of Hwaseong-si (KR)

Seungjun Lee of Hwaseong-si (KR)

Woosung Choi of Goyang-si (KR)

Haeyong Choi of Yongin-si (KR)

Joungwoo Han of Hwaseong-si (KR)

CATALYTIC DECOMPOSITION DEVICE AND INTEGRATED WASTE GAS TREATMENT SYSTEM - A simplified explanation of the abstract

This abstract first appeared for US patent application 18046495 titled 'CATALYTIC DECOMPOSITION DEVICE AND INTEGRATED WASTE GAS TREATMENT SYSTEM

Simplified Explanation

The abstract describes an integrated waste gas treatment system for a semiconductor manufacturing facility. The system includes an adsorption/desorption device that captures and concentrates organic compounds and organic nitrogen compounds from the waste gas. A catalytic decomposition device then removes these compounds from the desorbed gas through an oxidation-reduction process. Nitrogen oxides generated during this process are further eliminated through a selective reduction reaction.

• The system captures and concentrates organic compounds and organic nitrogen compounds from waste gas.
• A catalytic decomposition device removes these compounds through an oxidation-reduction process.
• Nitrogen oxides generated during the process are eliminated through a selective reduction reaction.

Potential Applications

• Semiconductor manufacturing facilities
• Other industrial facilities with waste gas containing organic compounds and organic nitrogen compounds

Problems Solved

• Reduction of organic compounds and organic nitrogen compounds in waste gas
• Elimination of nitrogen oxides generated during the treatment process

Benefits

• Improved air quality by removing harmful organic compounds and nitrogen oxides
• Compliance with environmental regulations for waste gas emissions
• Enhanced safety for workers in semiconductor manufacturing facilities.

Original Abstract Submitted

An integrated waste gas treatment system includes an adsorption/desorption device that receives a waste gas that includes an organic compound and an organic nitrogen compound exhausted from a semiconductor manufacturing facility, where the adsorption/desorption device adsorbs the organic compound and the organic nitrogen compound and concentrates and desorbs the organic compound and the organic nitrogen compound, and a catalytic decomposition device disposed adjacent to the adsorption/desorption device, where the catalytic decomposition device includes a catalytic chamber that provides a gas passage through which a gas desorbed from the adsorption/desorption device flows and an oxidation-reduction catalyst disposed in the gas passage that removes the organic compound and the organic nitrogen compound from the desorbed gas. The organic compound and the organic nitrogen compound are subjected to an oxidation treatment by the oxidation-reduction catalyst, and nitrogen oxides generated by the oxidation treatment are removed by a selective reduction reaction.