17962378. ATOMIC LAYER DEPOSITION COATING SYSTEM FOR INNER WALLS OF GAS LINES simplified abstract (Applied Materials, Inc.)

ATOMIC LAYER DEPOSITION COATING SYSTEM FOR INNER WALLS OF GAS LINES

Organization Name

Applied Materials, Inc.

Inventor(s)

Hanish Kumar Panavalappil Kumarankutty of Bangalore (IN)

Yogesh Tomar of Bangalore (IN)

Nikshep M. Patil of Bangalore (IN)

Hari Venkatesh Rajendran of Bangalore (IN)

Kirubanandan Naina Shanmugam of Bangalore (IN)

Gayatri Natu of Mumbai (IN)

Mahesh Arcot of Mumbai (IN)

Senthil Kumar Nattamai Subramanian of Hosur (IN)

Steven D. Marcus of San Jose CA (US)

Michael R. Rice of Pleasanton CA (US)

ATOMIC LAYER DEPOSITION COATING SYSTEM FOR INNER WALLS OF GAS LINES - A simplified explanation of the abstract

This abstract first appeared for US patent application 17962378 titled 'ATOMIC LAYER DEPOSITION COATING SYSTEM FOR INNER WALLS OF GAS LINES

Simplified Explanation

The abstract describes an apparatus for coating a plurality of gas lines using an ALD process. Here are some key points from the abstract:

• The apparatus includes an oven with an enclosure to house the gas lines.
• The enclosure has a door for transferring the gas lines in and out.
• Inlet ports are on one wall of the enclosure, while exhaust ports are on another wall.
• A fluid panel outside the oven is connected to the inlet ports.
• A foreline outside the oven is connected to the exhaust ports.

Potential Applications

The technology described in the patent application could be used in industries such as semiconductor manufacturing, solar panel production, and gas sensor fabrication.

Problems Solved

This technology solves the problem of efficiently and uniformly coating multiple gas lines using an ALD process, which can be challenging with traditional methods.

Benefits

The benefits of this technology include improved coating quality, increased productivity, reduced maintenance downtime, and enhanced process control.

Potential Commercial Applications

A potential commercial application for this technology could be in the production of advanced electronic devices, where precise and uniform coatings on gas lines are crucial for device performance.

Possible Prior Art

One possible prior art for this technology could be similar apparatuses used in other industries for coating purposes. However, the specific design and features of this apparatus may be unique to this patent application.

Unanswered Questions

1. What specific materials can be coated using this apparatus? 2. How does the efficiency of the coating process compare to traditional methods?

Original Abstract Submitted

Embodiments of an apparatus for coating a plurality of gas lines are provided herein. In some embodiments, an apparatus for coating a plurality of gas lines via an ALD process includes: an oven having an enclosure that defines an interior volume configured to house the plurality of gas lines, the enclosure having a door configured for transferring the plurality of gas lines into and out of the interior volume; a plurality of inlet ports disposed through a first wall of the enclosure; a plurality of exhaust ports disposed through a second wall of the enclosure; a fluid panel disposed outside of the oven and coupled to the plurality of inlet ports via corresponding ones of a plurality of fluid distribution assemblies; and a foreline disposed outside of the oven and coupled to the plurality of exhaust ports.