17962310. HALOGEN-RESISTANT THERMAL BARRIER COATING FOR PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)

From WikiPatents
Revision as of 04:10, 16 April 2024 by Wikipatents (talk | contribs) (Creating a new page)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search

HALOGEN-RESISTANT THERMAL BARRIER COATING FOR PROCESSING CHAMBERS

Organization Name

Applied Materials, Inc.

Inventor(s)

Amir H. Tavakoli of San Jose CA (US)

Ala Moradian of Sunnyvale CA (US)

Tetsuya Ishikawa of San Jose CA (US)

HALOGEN-RESISTANT THERMAL BARRIER COATING FOR PROCESSING CHAMBERS - A simplified explanation of the abstract

This abstract first appeared for US patent application 17962310 titled 'HALOGEN-RESISTANT THERMAL BARRIER COATING FOR PROCESSING CHAMBERS

Simplified Explanation

The patent application describes a coating for a processing chamber component that includes a metallic bond layer, a thermal barrier layer, and a ceramic sealing layer resistant to halogen-containing chemicals.

  • Metallic bond layer deposited on component surface
  • Thermal barrier layer deposited on bond layer
  • Non-porous ceramic sealing layer deposited on thermal barrier layer
  • Sealing layer conforms to surface irregularities
  • Sealing layer chemistry selected for resistance to halogen-containing chemicals

Potential Applications

The technology could be applied in semiconductor manufacturing, chemical processing, and other industries where components are exposed to harsh chemical environments.

Problems Solved

The coating provides protection against corrosion and chemical attack, extending the lifespan of processing chamber components and improving overall equipment performance.

Benefits

- Increased component durability - Enhanced resistance to halogen-containing chemicals - Improved reliability and efficiency of processing equipment

Potential Commercial Applications

"Chemical Resistant Coating for Processing Chamber Components" - Ideal for manufacturers of semiconductor equipment, chemical processing plants, and other industries requiring durable and chemically resistant components.

Possible Prior Art

There may be prior art related to coatings for processing chamber components, but specific information on similar technologies is not provided in the patent application.

Unanswered Questions

How does the coating affect the thermal properties of the processing chamber component?

The patent application does not detail the impact of the coating on the thermal conductivity or heat dissipation of the component.

Are there any limitations to the types of surfaces that can be coated with this technology?

The patent application does not address whether certain materials or surface finishes may be incompatible with the coating process.


Original Abstract Submitted

A coating on a processing chamber component includes a metallic bond layer deposited on a surface of the component. A thermal barrier layer is deposited on the bond layer. A substantially non-porous ceramic sealing layer is deposited on the thermal barrier layer. The sealing layer substantially conforms to irregularities of the surface of the thermal barrier layer. A chemistry of the sealing layer is selected for resistance to attack from halogen-containing chemicals.