17954316. SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR SAME simplified abstract (Changxin Memory Technologies, Inc.)

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SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR SAME

Organization Name

Changxin Memory Technologies, Inc.

Inventor(s)

Kang You of HEFEI (CN)

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 17954316 titled 'SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR SAME

Simplified Explanation

The patent application describes a semiconductor structure that includes a transistor structure, a capacitor structure, and a wordline staircase structure. These structures are arranged in a specific way to optimize their functionality.

  • The transistor structure and the capacitor structure are arranged along a first direction, with the capacitor structure extending along this direction.
  • The wordline staircase structure extends along a second direction that intersects with the first direction.
  • A reference plane is used, which is perpendicular to the second direction.
  • The transistor structure, capacitor structure, and wordline staircase structure are projected orthographically onto the reference plane.
  • The projection of the transistor structure is called the first projection.
  • The projection of the capacitor structure is called the second projection.
  • The projection of the wordline staircase structure is called the third projection.
  • The third projection covers the first projection, and partially overlaps the second projection.

Potential Applications:

  • This semiconductor structure can be used in various electronic devices, such as computers, smartphones, and tablets.
  • It can be applied in memory devices, processors, and other integrated circuits.

Problems Solved:

  • The arrangement of the transistor structure, capacitor structure, and wordline staircase structure optimizes their functionality and performance.
  • The overlapping projections ensure efficient use of space and improve the overall performance of the semiconductor structure.

Benefits:

  • The optimized arrangement and overlapping projections result in improved functionality and performance of the semiconductor structure.
  • The efficient use of space allows for more compact and smaller electronic devices.
  • The improved performance can lead to faster processing speeds and better energy efficiency.


Original Abstract Submitted

A semiconductor structure includes: a transistor structure and a capacitor structure that are arranged along a first direction, where the capacitor structure extends along the first direction; and a wordline staircase structure extending along the first direction, where the wordline staircase structure and the transistor structure are disposed along a second direction intersecting with the first direction. A plane perpendicular to the second direction is used as a reference plane. An orthographic projection of the transistor structure on the reference plane is a first projection. An orthographic projection of the capacitor structure on the reference plane is a second projection. An orthographic projection of the wordline staircase structure on the reference plane is a third projection. The third projection covers the first projection, and the third projection partially overlaps the second projection.

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