17886053. INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Chia Hao Chang of Hsinchu City (TW)
Pei-Cheng Hsu of Taipei City (TW)
Chih-Cheng Chen of Hsinchu City (TW)
Huan-Ling Lee of Hsinchu County (TW)
Ting-Hao Hsu of Hsinchu City (TW)
Hsin-Chang Lee of Hsinchu County (TW)
INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 17886053 titled 'INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM
Simplified Explanation
The method described in the patent application involves:
- Performing a lithography process using a mask and a pellicle membrane
- Detaching the pellicle membrane from the mask after the lithography process is completed
- Performing an inspection process to the pellicle membrane, including generating a laser beam toward the pellicle membrane from a laser source, such that the laser beam passes through the pellicle membrane
- Generating an image by receiving the laser beam passing through the pellicle membrane using an image sensor
- Determining whether a particle is present on the pellicle membrane or a pin hole is present in the pellicle membrane based on the image
Potential applications of this technology:
- Quality control in semiconductor manufacturing
- Inspection of photomasks in lithography processes
- Detection of defects in pellicle membranes used in photolithography
Problems solved by this technology:
- Ensuring the integrity of pellicle membranes used in lithography processes
- Detecting particles or pin holes that could affect the quality of the final product
- Improving the reliability of inspection processes in semiconductor manufacturing
Benefits of this technology:
- Enhanced quality control in semiconductor manufacturing
- Increased efficiency in detecting defects in pellicle membranes
- Reduction of potential errors in lithography processes
Original Abstract Submitted
A method includes performing a lithography process using a mask and a pellicle membrane; detaching the pellicle membrane from the mask after the lithography process is completed; performing an inspection process to the pellicle membrane, the inspection process including generating a laser beam toward the pellicle membrane from a laser source, such that the laser beam passes through the pellicle membrane; and generating an image by receiving the laser beam passing through the pellicle membrane using an image sensor; and determining whether a particle is present on the pellicle membrane or a pin hole is present in the pellicle membrane based on the image.
