17847477. EUV COLLECTOR INSPECTION APPARATUS AND INSPECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)

EUV COLLECTOR INSPECTION APPARATUS AND INSPECTION METHOD

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Jongbin Park of Gangneung-si (KR)

Jeonggil Kim of Hwaseong-si (KR)

Matsuda Yozo of Suwon-si (KR)

Donghyub Lee of Hwaseong-si (KR)

Dohyun Jung of Suwon-si (KR)

Yoojin Jeong of Suwon-si (KR)

Eunhee Jeang of Hwaseong-si (KR)

Wondon Joo of Seoul (KR)

Minseok Choi of Hwaseong-si (KR)

EUV COLLECTOR INSPECTION APPARATUS AND INSPECTION METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 17847477 titled 'EUV COLLECTOR INSPECTION APPARATUS AND INSPECTION METHOD

Simplified Explanation

An extreme ultraviolet (EUV) collector inspection apparatus is described in this patent application. The apparatus includes a light blocking cover that covers the front surface of the EUV collector to be inspected, creating a space where external light is blocked.

• The apparatus includes a light source in the space portion, which has a pillar shape and extends along the central axis of the EUV collector. The light source emits light in the ultraviolet (UV) band to visible light (VIS) band.

• A spectrometer is positioned above the light source and is used to detect the spectrum of reflected light from the front surface of the EUV collector.

• The apparatus or a controller associated with it can analyze the spectrum of reflected light to determine the contamination state of the front surface of the EUV collector.

Potential applications of this technology:

• Inspection and maintenance of extreme ultraviolet (EUV) collectors used in semiconductor manufacturing processes.

• Quality control and monitoring of EUV collectors to ensure optimal performance and efficiency.

• Research and development of EUV technology, allowing for better understanding and analysis of collector contamination.

Problems solved by this technology:

• The apparatus provides a non-destructive and efficient method for inspecting the contamination state of EUV collectors.

• It allows for real-time monitoring and analysis of the collector's condition, enabling timely maintenance and cleaning.

• The use of a spectrometer provides accurate and detailed information about the reflected light spectrum, aiding in the identification and characterization of contaminants.

Benefits of this technology:

• Improved reliability and performance of EUV collectors by detecting and addressing contamination issues promptly.

• Cost savings by avoiding unnecessary downtime and reducing the risk of equipment failure.

• Enhanced understanding of collector contamination and its impact on EUV technology, leading to advancements in semiconductor manufacturing processes.

Original Abstract Submitted

An extreme ultraviolet (EUV) collector inspection apparatus includes a light blocking cover covering a front surface of an EUV collector to be inspected and providing a space portion in which external light is blocked, a light source in the space portion, the light source having a pillar shape extending along a central axis of the EUV collector, the light source configured to output irradiated light ranging from an ultraviolet (UV) band to a visible light (VIS) band, and a spectrometer above the light source and configured to detect a spectrum of reflected light from the irradiated light reflected from the front surface of the EUV collector. The apparatus or a controller associated therewith may be configured to inspect a contamination state of the front surface of the EUV collector based on the spectrum of reflected light.