17751898. MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE simplified abstract (Samsung Electronics Co., Ltd.)

From WikiPatents
Revision as of 06:23, 2 January 2024 by Wikipatents (talk | contribs) (Creating a new page)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search

MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Sungchul Lee of Osan-si (KR)

Kyungjin Lee of Seoul (KR)

MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 17751898 titled 'MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE

Simplified Explanation

The abstract describes a patent application for a magneto resistive random access memory (MRAM) device that includes a spin orbit torque structure and a magnetic tunnel junction (MTJ) structure. The spin orbit torque structure consists of an oxide layer pattern, a ferromagnetic pattern, and a non-magnetic pattern. The MTJ structure consists of a free layer pattern, a tunnel barrier pattern, and a pinned layer pattern. The spin orbit torque structure extends in a first direction parallel to the upper surface of the device, while the free layer pattern has a magnetization direction in a vertical direction perpendicular to the upper surface. The magnetization direction of the free layer pattern can be changed by spin currents generated in the spin orbit torque structure.

  • The MRAM device includes a spin orbit torque structure and a magnetic tunnel junction (MTJ) structure.
  • The spin orbit torque structure consists of an oxide layer pattern, a ferromagnetic pattern, and a non-magnetic pattern.
  • The MTJ structure consists of a free layer pattern, a tunnel barrier pattern, and a pinned layer pattern.
  • The spin orbit torque structure extends parallel to the upper surface of the device.
  • The ferromagnetic pattern contains a horizontal magnetic material.
  • The free layer pattern has a magnetization direction in a vertical direction perpendicular to the upper surface.
  • The magnetization direction of the free layer pattern can be changed by spin currents generated in the spin orbit torque structure.

Potential Applications

  • MRAM devices can be used in various electronic devices, such as computers, smartphones, and IoT devices.
  • The ability to change the magnetization direction of the free layer pattern allows for data storage and retrieval in MRAM devices.

Problems Solved

  • Traditional MRAM devices have limitations in terms of speed, density, and power consumption.
  • The spin orbit torque structure in this patent application addresses these limitations by enabling efficient magnetization direction changes.

Benefits

  • The use of spin orbit torque structure allows for faster and more efficient data storage and retrieval in MRAM devices.
  • The ability to change the magnetization direction of the free layer pattern provides flexibility in data manipulation.
  • The MRAM device described in the patent application has the potential to overcome the limitations of traditional MRAM devices.


Original Abstract Submitted

A magneto resistive random access memory (MRAM) device including a spin orbit torque structure including a stack of an oxide layer pattern, a ferromagnetic pattern, and a non-magnetic pattern; and a magnetic tunnel junction (MTJ) structure on the spin orbit torque structure, the MTJ structure including a stack of a free layer pattern, a tunnel barrier pattern, and a pinned layer pattern, wherein the spin orbit torque structure extends in a first direction parallel to an upper surface of the spin orbit torque structure, the ferromagnetic pattern includes a horizontal magnetic material, and the free layer pattern has a magnetization direction in a vertical direction perpendicular to the upper surface of the spin orbit torque structure, the magnetization direction being changeable in response to spin currents generated in the spin orbit torque structure.