17749899. RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Ran Namgung of Suwon-si (KR)

Daeseok Song of Suwon-si (KR)

Minsoo Kim of Suwon-si (KR)

Hyeon Park of Suwon-si (KR)

Minki Chon of Suwon-si (KR)

Jun Soo Kim of Hwaseong-si (KR)

Hyun-Woo Kim of Seongnam-si (KR)

Hyun-Ji Song of Anyang-si (KR)

Young Joo Choi of Hwaseong-si (KR)

Suk-Koo Hong of Hwaseong-si (KR)

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION - A simplified explanation of the abstract

This abstract first appeared for US patent application 17749899 titled 'RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Simplified Explanation

The abstract describes a resist topcoat composition and a method for forming patterns using this composition. The resist topcoat composition includes an acrylic polymer with a hydroxy group and fluorine, an acid compound with fluorine, and a solvent.

• The resist topcoat composition is used to form patterns in various applications.
• The composition includes an acrylic polymer with a hydroxy group and fluorine, providing specific properties to the resist topcoat.
• The composition also includes at least one acid compound with fluorine, which enhances the performance of the resist topcoat.
• The solvent in the composition helps in the application and processing of the resist topcoat.

Potential Applications

• Semiconductor manufacturing
• Printed circuit board fabrication
• Microelectronics industry

Problems Solved

• Provides a resist topcoat composition that can be used to form patterns with improved performance.
• Offers a solution for achieving precise and accurate patterns in various manufacturing processes.
• Addresses the need for a resist topcoat composition that can withstand harsh processing conditions.

Benefits

• Improved pattern formation with high precision and accuracy.
• Enhanced resistance to harsh processing conditions.
• Increased efficiency and reliability in manufacturing processes.

Original Abstract Submitted

A resist topcoat composition and a method of forming patterns using the resist topcoat composition are provided. The resist topcoat resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; at least one acid compound selected from a sulfonic acid compound containing at least one fluorine, a sulfonimide compound containing at least one fluorine, and a carboxylic acid compound containing at least one fluorine; and a solvent.