17741692. POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
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Contents
- 1 POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Abstract
- 1.6 Patent/Innovation Explanation
- 1.7 Potential Applications
- 1.8 Problems Solved
- 1.9 Benefits
- 1.10 Original Abstract Submitted
POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME
Organization Name
Inventor(s)
Joonsong Park of Suwon-si (KR)
POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 17741692 titled 'POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME
Simplified Explanation
Abstract
A polypeptide, a photoresist composition including the polypeptide, and a method of forming patterns by using the photoresist composition.
Patent/Innovation Explanation
- The patent application describes a new polypeptide and its use in a photoresist composition.
- The photoresist composition can be used to form patterns in various applications.
- The method of forming patterns using the photoresist composition is also disclosed.
Potential Applications
- Semiconductor manufacturing: The photoresist composition can be used in the fabrication of microchips and other electronic devices.
- Nanotechnology: The composition can be utilized in the production of nanoscale structures and devices.
- Biotechnology: The polypeptide may have applications in the development of biochips, biosensors, and other biotechnological devices.
Problems Solved
- Improved patterning: The new polypeptide and photoresist composition may offer enhanced precision and resolution in pattern formation.
- Simplified manufacturing process: The method described in the patent application may streamline the production of patterns, reducing costs and time.
Benefits
- Higher quality patterns: The use of the polypeptide and photoresist composition may result in patterns with improved accuracy and definition.
- Increased efficiency: The new method of forming patterns may allow for faster and more efficient manufacturing processes.
- Versatility: The photoresist composition can be applied in various industries and applications, providing flexibility and adaptability.
Original Abstract Submitted
A polypeptide, a photoresist composition including the polypeptide, and a method of forming patterns by using the photoresist composition.
