17461744. LITHOGRAPHY CONTAMINATION CONTROL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
LITHOGRAPHY CONTAMINATION CONTROL
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Shang-Chieh Chien of Hsinchu (TW)
LITHOGRAPHY CONTAMINATION CONTROL - A simplified explanation of the abstract
This abstract first appeared for US patent application 17461744 titled 'LITHOGRAPHY CONTAMINATION CONTROL
Simplified Explanation
The abstract describes a lithography system that prevents contaminants from entering the scanner. The system includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source generates extreme ultraviolet light using a droplet generator, a collector, and a light generator. The scanner has a wafer stage, and the hollow connection member connects the light source and the scanner, providing a space for the light to focus.
- The lithography system prevents contaminants from entering the scanner.
- It includes a processor, extreme ultraviolet light source, scanner, and hollow connection member.
- The light source generates extreme ultraviolet light using a droplet generator, collector, and light generator.
- The scanner has a wafer stage for processing.
- The hollow connection member connects the light source and scanner, providing a space for light focus.
Potential Applications
- Semiconductor manufacturing
- Nanotechnology research
- Optical lithography processes
Problems Solved
- Contamination of the scanner by debris
- Maintaining a clean environment for lithography processes
Benefits
- Improved quality and reliability of lithography processes
- Reduced downtime and maintenance costs
- Enhanced performance and accuracy in semiconductor manufacturing
Original Abstract Submitted
A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.
