View source for 17461744. LITHOGRAPHY CONTAMINATION CONTROL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

=LITHOGRAPHY CONTAMINATION CONTROL=


==Organization Name==

[[:Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.|TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]


[[Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]

==Inventor(s)==

[[:Category:Chieh Hsieh of Hsinchu (TW)|Chieh Hsieh of Hsinchu (TW)]][[Category:Chieh Hsieh of Hsinchu (TW)]]

[[:Category:Tai-Yu Chen of Hsinchu (TW)|Tai-Yu Chen of Hsinchu (TW)]][[Category:Tai-Yu Chen of Hsinchu (TW)]]

[[:Category:Cho-Ying Lin of Hsinchu (TW)|Cho-Ying Lin of Hsinchu (TW)]][[Category:Cho-Ying Lin of Hsinchu (TW)]]

[[:Category:Shang-Chieh Chien of Hsinchu (TW)|Shang-Chieh Chien of Hsinchu (TW)]][[Category:Shang-Chieh Chien of Hsinchu (TW)]]

[[:Category:Li-Jui Chen of Hsinchu (TW)|Li-Jui Chen of Hsinchu (TW)]][[Category:Li-Jui Chen of Hsinchu (TW)]]

[[:Category:Heng-Hsin Liu of Hsinchu (TW)|Heng-Hsin Liu of Hsinchu (TW)]][[Category:Heng-Hsin Liu of Hsinchu (TW)]]

==LITHOGRAPHY CONTAMINATION CONTROL - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17461744 titled 'LITHOGRAPHY CONTAMINATION CONTROL

==Simplified Explanation==

The abstract describes a lithography system that prevents contaminants from entering the scanner. The system includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source generates extreme ultraviolet light using a droplet generator, a collector, and a light generator. The scanner has a wafer stage, and the hollow connection member connects the light source and the scanner, providing a space for the light to focus.

* The lithography system prevents contaminants from entering the scanner.
* It includes a processor, extreme ultraviolet light source, scanner, and hollow connection member.
* The light source generates extreme ultraviolet light using a droplet generator, collector, and light generator.
* The scanner has a wafer stage for processing.
* The hollow connection member connects the light source and scanner, providing a space for light focus.

== Potential Applications ==
* Semiconductor manufacturing
* Nanotechnology research
* Optical lithography processes

== Problems Solved ==
* Contamination of the scanner by debris
* Maintaining a clean environment for lithography processes

== Benefits ==
* Improved quality and reliability of lithography processes
* Reduced downtime and maintenance costs
* Enhanced performance and accuracy in semiconductor manufacturing


==Original Abstract Submitted==

A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.



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