17460108. APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

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APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor(s)

Yu-Huan Chen of Hsinchu (TW)

Yu-Chih Huang of Hsinchu (TW)

Ming-Hsun Tsai of Hsinchu CIty (TW)

Shang-Chieh Chien of New Taipei City (TW)

Heng-Hsin Liu of New Taipei City (TW)

APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION - A simplified explanation of the abstract

This abstract first appeared for US patent application 17460108 titled 'APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

Simplified Explanation

The abstract describes a patent application for a target droplet source used in extreme ultraviolet (EUV) sources. The droplet generator is designed to produce droplets of a specific material, which are then supplied through a nozzle within a chamber. The nozzle tube within the droplet generator has a structured nozzle pattern that imparts angular momentum to the droplets.

  • The patent application is for a target droplet source used in extreme ultraviolet (EUV) sources.
  • The droplet generator is configured to produce droplets of a specific material.
  • The droplets are supplied through a nozzle within a chamber.
  • A nozzle tube within the droplet generator has a structured nozzle pattern.
  • The structured nozzle pattern imparts angular momentum to the droplets.

Potential Applications

  • Extreme ultraviolet (EUV) lithography
  • EUV microscopy
  • EUV spectroscopy
  • EUV surface analysis

Problems Solved

  • Provides a reliable and efficient method for generating target droplets for EUV sources.
  • Enables precise control over the size and composition of the droplets.
  • Enhances the angular momentum of the droplets, improving their stability and accuracy in EUV applications.

Benefits

  • Improved performance and accuracy in EUV lithography, microscopy, spectroscopy, and surface analysis.
  • Enhanced control over droplet size and composition.
  • Increased stability and efficiency in EUV sources.


Original Abstract Submitted

A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets.

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