View source for 17460108. APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

=APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION=


==Organization Name==

[[:Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.|TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]


[[Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]

==Inventor(s)==

[[:Category:Yu-Huan Chen of Hsinchu (TW)|Yu-Huan Chen of Hsinchu (TW)]][[Category:Yu-Huan Chen of Hsinchu (TW)]]

[[:Category:Yu-Chih Huang of Hsinchu (TW)|Yu-Chih Huang of Hsinchu (TW)]][[Category:Yu-Chih Huang of Hsinchu (TW)]]

[[:Category:Ming-Hsun Tsai of Hsinchu CIty (TW)|Ming-Hsun Tsai of Hsinchu CIty (TW)]][[Category:Ming-Hsun Tsai of Hsinchu CIty (TW)]]

[[:Category:Shang-Chieh Chien of New Taipei City (TW)|Shang-Chieh Chien of New Taipei City (TW)]][[Category:Shang-Chieh Chien of New Taipei City (TW)]]

[[:Category:Heng-Hsin Liu of New Taipei City (TW)|Heng-Hsin Liu of New Taipei City (TW)]][[Category:Heng-Hsin Liu of New Taipei City (TW)]]

==APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17460108 titled 'APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

==Simplified Explanation==

The abstract describes a patent application for a target droplet source used in extreme ultraviolet (EUV) sources. The droplet generator is designed to produce droplets of a specific material, which are then supplied through a nozzle within a chamber. The nozzle tube within the droplet generator has a structured nozzle pattern that imparts angular momentum to the droplets.

* The patent application is for a target droplet source used in extreme ultraviolet (EUV) sources.
* The droplet generator is configured to produce droplets of a specific material.
* The droplets are supplied through a nozzle within a chamber.
* A nozzle tube within the droplet generator has a structured nozzle pattern.
* The structured nozzle pattern imparts angular momentum to the droplets.

== Potential Applications ==
* Extreme ultraviolet (EUV) lithography
* EUV microscopy
* EUV spectroscopy
* EUV surface analysis

== Problems Solved ==
* Provides a reliable and efficient method for generating target droplets for EUV sources.
* Enables precise control over the size and composition of the droplets.
* Enhances the angular momentum of the droplets, improving their stability and accuracy in EUV applications.

== Benefits ==
* Improved performance and accuracy in EUV lithography, microscopy, spectroscopy, and surface analysis.
* Enhanced control over droplet size and composition.
* Increased stability and efficiency in EUV sources.


==Original Abstract Submitted==

A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets.



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