US Patent Application 18095642. SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME simplified abstract

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SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME

Organization Name

Samsung Electronics Co., Ltd.


Inventor(s)

Juil Choi of Suwon-si (KR)

Jusuk Kang of Suwon-si (KR)

Hyungjun Park of Suwon-si (KR)

Sanghyuck Oh of Suwon-si (KR)

Hyunju Lee of Suwon-si (KR)

Sangyeol Choi of Suwon-si (KR)

SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18095642 titled 'SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME

Simplified Explanation

The patent application describes a semiconductor package and a method of manufacturing it.

  • The semiconductor package is designed to maximize heat dissipation efficiency.
  • It includes a first redistribution substrate, a first semiconductor chip, and a plurality of through posts.
  • The first semiconductor chip is placed on the first redistribution substrate.
  • The through posts are located around the first semiconductor chip on the first redistribution substrate.
  • The package also includes a second redistribution substrate that is positioned over the first semiconductor chip and the through posts.
  • The top surface of the first semiconductor chip is in contact with the bottom surface of the second redistribution substrate.


Original Abstract Submitted

Provided are a semiconductor package having a structure maximizing heat dissipation efficiency and a method of manufacturing the same. The semiconductor package includes a first redistribution substrate, a first semiconductor chip on the first redistribution substrate, a plurality of through posts on the first redistribution substrate, around the first semiconductor chip, and a second redistribution substrate located over the first semiconductor chip and the through posts, wherein a top surface of the first semiconductor chip is in contact with a bottom surface of the second redistribution substrate.