US Patent Application 18094786. SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME simplified abstract

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SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

Organization Name

Samsung Electronics Co., Ltd.


Inventor(s)

Sungsik Park of Suwon-si (KR)


Jeonghyun Kim of Suwon-si (KR)


Jonghwa Baek of Suwon-si (KR)


Hyunju Song of Suwon-si (KR)


Bumjoon Youn of Suwon-si (KR)


SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A simplified explanation of the abstract

'This abstract first appeared for US patent application 18094786 titled 'SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME'

Simplified Explanation

The abstract describes a semiconductor device that includes various components. These components include a substrate with a key region, a dummy active pattern on the key region, a dummy channel pattern on the dummy active pattern, and an epitaxial pattern connected to the dummy channel pattern. Additionally, there is a first sub-key pattern on the dummy channel pattern, which encloses the top, bottom, and side surfaces of a group of semiconductor patterns.


Original Abstract Submitted

A semiconductor device includes a substrate including a key region, a dummy active pattern provided on the key region, a dummy channel pattern provided on the dummy active pattern, the dummy channel pattern including a first plurality of semiconductor patterns spaced apart from each other, an epitaxial pattern connected to the dummy channel pattern, and a first sub-key pattern provided on the dummy channel pattern. The first sub-key pattern encloses a top surface, a bottom surface, and side surfaces of each of the first plurality of semiconductor patterns.