Samsung display co., ltd. (20240110273). MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK simplified abstract
Contents
- 1 MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK
Organization Name
Inventor(s)
YOUNGMIN Moon of Yongin-si (KR)
MINHO Moon of Seongnam-si (KR)
SEUNGYONG Song of Suwon-si (KR)
MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240110273 titled 'MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK
Simplified Explanation
The patent application describes a mask assembly with a mask frame and a deposition mask attached to the front surface of the frame. The mask frame has a first opening, while the deposition mask has multiple second openings. The front surface of the mask frame and the initial mask of the deposition mask are aligned along the direction of gravity.
- Mask assembly with mask frame and deposition mask
- Mask frame has a first opening, deposition mask has multiple second openings
- Front surface of mask frame and initial mask aligned along direction of gravity
Potential Applications
The technology could be used in industries such as semiconductor manufacturing, photolithography, and microelectronics for precise deposition processes.
Problems Solved
The technology solves the problem of misalignment between the mask frame and deposition mask, ensuring accurate and consistent deposition of materials.
Benefits
- Improved accuracy in material deposition processes - Enhanced efficiency in manufacturing processes - Consistent and reliable results
Potential Commercial Applications
"Precision Mask Assembly for Semiconductor Manufacturing: Enhancing Deposition Processes"
Possible Prior Art
There may be prior art related to mask assemblies in the field of semiconductor manufacturing and photolithography, but specific examples are not provided in the abstract.
Unanswered Questions
How does this technology compare to existing mask assembly methods in terms of cost-effectiveness?
The article does not provide information on the cost-effectiveness of this technology compared to existing methods. Further research or data would be needed to address this question.
What are the potential limitations or challenges in implementing this technology on an industrial scale?
The article does not discuss any potential limitations or challenges in scaling up the use of this technology in industrial settings. Additional studies or practical applications may be necessary to address this question.
Original Abstract Submitted
a mask assembly includes a mask frame in which a first opening is defined, the mask frame including a front surface through which the first opening extends, and a deposition mask which is attached to the front surface of the mask frame and through which a plurality of second openings is defined. the mask frame includes an in which the front surface extends along a direction of gravity, the deposition mask includes an initial mask which is attached to the front surface of the mask frame in the thereof and through which the plurality of second openings is defined, and the of the mask frame having the front surface which extends along the direction of gravity disposes the first opening of the mask frame corresponding to all of the plurality of second openings of the initial mask along the direction of gravity.
