17899263. ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY simplified abstract (META PLATFORMS, INC.)
Contents
- 1 ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY
Organization Name
Inventor(s)
Daniel Albert Corliss of Redmond WA (US)
ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY - A simplified explanation of the abstract
This abstract first appeared for US patent application 17899263 titled 'ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY
Simplified Explanation
The abstract describes a system for creating patterns on a wafer using an attenuated phase shift mask with variable feature sizes and Talbot lithography.
- The system involves using an attenuated phase shift mask, which allows for precise control over the exposure of light during lithography.
- Variable feature sizes can be achieved by adjusting the mask, enabling the creation of complex patterns on the wafer.
- Talbot lithography is utilized in the process, which involves the interference of light waves to create high-resolution patterns.
Potential Applications
The technology can be applied in the semiconductor industry for the fabrication of integrated circuits and microelectronics.
Problems Solved
This technology solves the problem of achieving precise and variable feature sizes on a wafer, which is crucial for the production of advanced semiconductor devices.
Benefits
The system offers high precision and flexibility in creating patterns, leading to improved performance and functionality of semiconductor devices.
Potential Commercial Applications
The technology can be utilized by semiconductor manufacturers to produce cutting-edge integrated circuits and microchips for various electronic devices.
Possible Prior Art
Prior art in the field of lithography includes traditional photolithography techniques and other mask-based patterning methods.
Unanswered Questions
How does the system handle defects in the mask or wafer during the patterning process?
The article does not address how the system deals with defects that may arise during the patterning process.
What is the cost-effectiveness of implementing this technology compared to traditional lithography methods?
The article does not provide information on the cost implications of using this system versus conventional lithography techniques.
Original Abstract Submitted
A system for creating patterns on a wafer by using an attenuated phase shift mask with variable feature sizes and using Talbot lithography.
