18298574. WAVELENGTH TUNING IN SILICON PHOTONICS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
Contents
WAVELENGTH TUNING IN SILICON PHOTONICS
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
WAVELENGTH TUNING IN SILICON PHOTONICS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18298574 titled 'WAVELENGTH TUNING IN SILICON PHOTONICS
Simplified Explanation
The abstract describes a method of wavelength tuning in a silicon photonics circuit involving a ring resonator and a dielectric layer.
- Receiving a bus waveguide, a ring resonator optically coupled to the bus waveguide, and a dielectric layer over both components.
- Performing a first heat process at a first temperature to heat up the dielectric layer.
- The first heat process shifts the initial resonance wavelength of the ring resonator to a shorter first resonance wavelength.
- The first heat process permanently shifts the initial resonance wavelength to the first resonance wavelength, which is the wavelength when no heat is applied to the ring resonator.
Potential Applications
- Optical communications
- Sensing applications
- Quantum computing
Problems Solved
- Precise wavelength tuning in silicon photonics circuits
- Enhanced performance of ring resonators
- Increased flexibility in optical signal processing
Benefits
- Improved control over wavelength tuning
- Enhanced functionality of silicon photonics circuits
- Increased efficiency in optical signal processing
Original Abstract Submitted
A method of wavelength tuning in a silicon photonics circuit includes receiving a bus waveguide, a ring resonator optically coupled to the bus waveguide, and a dielectric layer over the bus waveguide and over the ring resonator. The method further includes performing a first heat process at a first temperature to heat up the dielectric layer, where the first heat process shifts an initial resonance wavelength of the ring resonator to a first resonance wavelength shorter than the initial resonance wavelength. The first heat process permanently shifts the initial resonance wavelength to the first resonance wavelength, the first resonance wavelength being a wavelength when no heat is being applied to the ring resonator.
