18114126. PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

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PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Pei-Cheng Hsu of Taipei (TW)

Ting-Pi Sun of Taichung City (TW)

Hsin-Chang Lee of Zhubei City (TW)

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF - A simplified explanation of the abstract

This abstract first appeared for US patent application 18114126 titled 'PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF

Simplified Explanation

The abstract describes a method of manufacturing a pellicle for an extreme ultraviolet (EUV) photomask. The method involves forming a nanotube layer consisting of multiple carbon nanotubes, attaching the nanotube layer to a pellicle frame, and subjecting the nanotube layer to a Joule heating treatment by passing electric current through it.

  • The nanotube layer is formed using carbon nanotubes.
  • The nanotube layer is attached to a pellicle frame.
  • A Joule heating treatment is applied to the nanotube layer by passing electric current through it.

Potential Applications:

  • Manufacturing of pellicles for extreme ultraviolet (EUV) photomasks.
  • Enhancing the performance and durability of pellicles used in EUV lithography.

Problems Solved:

  • Improving the thermal stability and mechanical strength of pellicles.
  • Enhancing the resistance of pellicles to extreme ultraviolet (EUV) radiation.

Benefits:

  • Increased durability and lifespan of pellicles.
  • Improved protection of EUV photomasks from contamination and damage.
  • Enhanced performance and reliability of EUV lithography systems.


Original Abstract Submitted

In a method of manufacturing a pellicle for an extreme ultraviolet (EUV) photomask, a nanotube layer including a plurality of carbon nanotubes is formed, the nanotube layer is attached to a pellicle frame, and a Joule hearting treatment is performed to the nanotube layer by applying electric current through the nanotube layer.

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