18373364. SEMICONDUCTOR MANUFACTURING APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)

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SEMICONDUCTOR MANUFACTURING APPARATUS

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Jae Hyun Yang of Suwon-si (KR)

Sang Yub Ie of Hwaseong-si (KR)

Tae Yong Kim of Suwon-si (KR)

Phil Ouk Nam of Suwon-si (KR)

SEMICONDUCTOR MANUFACTURING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18373364 titled 'SEMICONDUCTOR MANUFACTURING APPARATUS

Simplified Explanation

The abstract describes a semiconductor manufacturing apparatus that includes a process chamber and a boat with a support member for substrates. The boat is enclosed by an inner tube with a slit along one side. A nozzle supplies a process gas and has a gas injection port positioned at the slit. The gas injection port has a first inlet and outlet, while the slit has a second inlet and outlet. The distances between the inlets/outlets and a center line connecting the centers of the first inlet and second outlet are different.

  • The semiconductor manufacturing apparatus includes a process chamber and a boat with a support member for substrates.
  • An inner tube encloses the boat and has a slit along one side.
  • A nozzle supplies a process gas and has a gas injection port positioned at the slit.
  • The gas injection port has a first inlet and outlet.
  • The slit has a second inlet and outlet.
  • The distances between the inlets/outlets and a center line connecting the centers of the first inlet and second outlet are different.

Potential Applications:

  • Semiconductor manufacturing processes
  • Thin film deposition
  • Etching processes

Problems Solved:

  • Improved distribution of process gas within the process chamber
  • Enhanced control of gas flow and uniformity of deposition/etching processes

Benefits:

  • Improved process efficiency and yield
  • Enhanced quality and uniformity of semiconductor devices
  • Reduced manufacturing costs


Original Abstract Submitted

A semiconductor manufacturing apparatus including a process chamber and a boat having a support member supporting substrates arranged in a first direction. An inner tube encloses the boat and includes a slit along a side wall. A nozzle supplies a process gas and includes a gas injection port at a position corresponding to the slit. The gas injection port includes a first inlet and first outlet. The slit includes a second inlet and second outlet. A distance to an end of the first inlet from a center line that connects a center of the first inlet and a center of the second outlet is different from the distance from the center line to an end of the first outlet and/or a distance from the center line to an end of the second inlet is different from a distance from the center line to an end of the second outlet.