US Patent Application 18324189. Fabric Processing Device simplified abstract

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Fabric Processing Device

Organization Name

SEIKO EPSON CORPORATION

Inventor(s)

Hirokazu Sekino of Chino (JP)

Osamu Katsuda of Matsumoto (JP)

Fabric Processing Device - A simplified explanation of the abstract

This abstract first appeared for US patent application 18324189 titled 'Fabric Processing Device

Simplified Explanation

The patent application describes a fabric processing device that improves the texture of fabric by ejecting liquid droplets onto it.

  • Fabric processing device transports fabric in a specific direction.
  • A support unit holds the fabric in place during processing.
  • A liquid ejecting unit sprays liquid onto the fabric.
  • An adjusting unit controls the liquid flow to collide with the fabric as droplets.
  • This configuration enhances the texture of the fabric.


Original Abstract Submitted

A fabric processing device includes a transport unit configured to transport a fabric in a transport direction; a support unit configured to support the fabric; a liquid ejecting unit configured to eject a liquid onto the fabric supported by the support unit; and an adjusting unit configured to adjust the liquid ejected as a continuous flow from the liquid ejecting unit to collide with the fabric in a state of being liquid droplets. The fabric processing device having such a configuration can effectively improve texture of the fabric.

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