US Patent Application 17745585. TOOL EXHAUST SYSTEM AND TREATMENT METHOD simplified abstract
Contents
TOOL EXHAUST SYSTEM AND TREATMENT METHOD
Organization Name
Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor(s)
Chih-Ming Tsao of Hsinchu (TW)
TOOL EXHAUST SYSTEM AND TREATMENT METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 17745585 titled 'TOOL EXHAUST SYSTEM AND TREATMENT METHOD
Simplified Explanation
- The patent application is about systems and methods for removing impurities from exhaust gases produced by semiconductor processing tools. - The impurities include acid or alkaline components and volatile organic components. - The system utilizes cooled scrubbing fluids and non-random structured packing materials to enhance the removal of these impurities. - The removal efficiencies for acid or alkaline components are described to be greater than 90%. - The removal efficiencies for volatile organic components are described to be greater than 70%.
Original Abstract Submitted
Systems and methods for removing impurities from exhaust gases produced by semiconductor processing tools, e.g., such as a wet bench, utilize cooled scrubbing fluids and non-random structured packing materials to achieve and enhance removal of acid or alkaline components in the exhaust gas along with an enhanced removal of volatile organic components in the exhaust gas. Removal efficiencies of the acid or alkaline components of greater than 90% and removal efficiencies of the volatile organic components of greater than 70% are described.
