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Bibliographic details for US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract

Citation styles for US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract

APA style

US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract. (2023, December 1). WikiPatents, . Retrieved 03:06, June 3, 2024 from http://wikipatents.org/index.php?title=US_Patent_Application_18446539._METHOD_OF_FABRICATING_A_SOURCE/DRAIN_RECESS_IN_A_SEMICONDUCTOR_DEVICE_simplified_abstract&oldid=9023.

MLA style

"US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract." WikiPatents, . 1 Dec 2023, 10:19 UTC. 3 Jun 2024, 03:06 <http://wikipatents.org/index.php?title=US_Patent_Application_18446539._METHOD_OF_FABRICATING_A_SOURCE/DRAIN_RECESS_IN_A_SEMICONDUCTOR_DEVICE_simplified_abstract&oldid=9023>.

MHRA style

WikiPatents contributors, 'US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract', WikiPatents, , 1 December 2023, 10:19 UTC, <http://wikipatents.org/index.php?title=US_Patent_Application_18446539._METHOD_OF_FABRICATING_A_SOURCE/DRAIN_RECESS_IN_A_SEMICONDUCTOR_DEVICE_simplified_abstract&oldid=9023> [accessed 3 June 2024]

Chicago style

WikiPatents contributors, "US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=US_Patent_Application_18446539._METHOD_OF_FABRICATING_A_SOURCE/DRAIN_RECESS_IN_A_SEMICONDUCTOR_DEVICE_simplified_abstract&oldid=9023 (accessed June 3, 2024).

CBE/CSE style

WikiPatents contributors. US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract [Internet]. WikiPatents, ; 2023 Dec 1, 10:19 UTC [cited 2024 Jun 3]. Available from: http://wikipatents.org/index.php?title=US_Patent_Application_18446539._METHOD_OF_FABRICATING_A_SOURCE/DRAIN_RECESS_IN_A_SEMICONDUCTOR_DEVICE_simplified_abstract&oldid=9023.

Bluebook style

US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract, http://wikipatents.org/index.php?title=US_Patent_Application_18446539._METHOD_OF_FABRICATING_A_SOURCE/DRAIN_RECESS_IN_A_SEMICONDUCTOR_DEVICE_simplified_abstract&oldid=9023 (last visited June 3, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "http://wikipatents.org/index.php?title=US_Patent_Application_18446539._METHOD_OF_FABRICATING_A_SOURCE/DRAIN_RECESS_IN_A_SEMICONDUCTOR_DEVICE_simplified_abstract&oldid=9023",
   note = "[Online; accessed 3-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18446539. METHOD OF FABRICATING A SOURCE/DRAIN RECESS IN A SEMICONDUCTOR DEVICE simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "\url{http://wikipatents.org/index.php?title=US_Patent_Application_18446539._METHOD_OF_FABRICATING_A_SOURCE/DRAIN_RECESS_IN_A_SEMICONDUCTOR_DEVICE_simplified_abstract&oldid=9023}",
   note = "[Online; accessed 3-June-2024]"
 }


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