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Bibliographic details for US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract
- Page name: US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 10 November 2023 06:49 UTC
- Date retrieved: 28 May 2024 18:14 UTC
- Permanent URL: http://wikipatents.org/index.php?title=US_Patent_Application_18356860._Dipole-Engineered_High-K_Gate_Dielectric_and_Method_Forming_Same_simplified_abstract&oldid=7176
- Page Version ID: 7176
Citation styles for US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract
APA style
US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract. (2023, November 10). WikiPatents, . Retrieved 18:14, May 28, 2024 from http://wikipatents.org/index.php?title=US_Patent_Application_18356860._Dipole-Engineered_High-K_Gate_Dielectric_and_Method_Forming_Same_simplified_abstract&oldid=7176.
MLA style
"US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract." WikiPatents, . 10 Nov 2023, 06:49 UTC. 28 May 2024, 18:14 <http://wikipatents.org/index.php?title=US_Patent_Application_18356860._Dipole-Engineered_High-K_Gate_Dielectric_and_Method_Forming_Same_simplified_abstract&oldid=7176>.
MHRA style
WikiPatents contributors, 'US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract', WikiPatents, , 10 November 2023, 06:49 UTC, <http://wikipatents.org/index.php?title=US_Patent_Application_18356860._Dipole-Engineered_High-K_Gate_Dielectric_and_Method_Forming_Same_simplified_abstract&oldid=7176> [accessed 28 May 2024]
Chicago style
WikiPatents contributors, "US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=US_Patent_Application_18356860._Dipole-Engineered_High-K_Gate_Dielectric_and_Method_Forming_Same_simplified_abstract&oldid=7176 (accessed May 28, 2024).
CBE/CSE style
WikiPatents contributors. US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract [Internet]. WikiPatents, ; 2023 Nov 10, 06:49 UTC [cited 2024 May 28]. Available from: http://wikipatents.org/index.php?title=US_Patent_Application_18356860._Dipole-Engineered_High-K_Gate_Dielectric_and_Method_Forming_Same_simplified_abstract&oldid=7176.
Bluebook style
US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract, http://wikipatents.org/index.php?title=US_Patent_Application_18356860._Dipole-Engineered_High-K_Gate_Dielectric_and_Method_Forming_Same_simplified_abstract&oldid=7176 (last visited May 28, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract --- WikiPatents{,} ",
year = "2023",
url = "http://wikipatents.org/index.php?title=US_Patent_Application_18356860._Dipole-Engineered_High-K_Gate_Dielectric_and_Method_Forming_Same_simplified_abstract&oldid=7176",
note = "[Online; accessed 28-May-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "US Patent Application 18356860. Dipole-Engineered High-K Gate Dielectric and Method Forming Same simplified abstract --- WikiPatents{,} ",
year = "2023",
url = "\url{http://wikipatents.org/index.php?title=US_Patent_Application_18356860._Dipole-Engineered_High-K_Gate_Dielectric_and_Method_Forming_Same_simplified_abstract&oldid=7176}",
note = "[Online; accessed 28-May-2024]"
}
