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Bibliographic details for 18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

Citation styles for 18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

APA style

18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, April 15). WikiPatents, . Retrieved 14:44, June 3, 2024 from http://wikipatents.org/index.php?title=18166750._SEMICONDUCTOR_DEVICE_STRUCTURE_WITH_GATE_DIELECTRIC_LAYER_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=52913.

MLA style

"18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 15 Apr 2024, 17:29 UTC. 3 Jun 2024, 14:44 <http://wikipatents.org/index.php?title=18166750._SEMICONDUCTOR_DEVICE_STRUCTURE_WITH_GATE_DIELECTRIC_LAYER_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=52913>.

MHRA style

WikiPatents contributors, '18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 15 April 2024, 17:29 UTC, <http://wikipatents.org/index.php?title=18166750._SEMICONDUCTOR_DEVICE_STRUCTURE_WITH_GATE_DIELECTRIC_LAYER_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=52913> [accessed 3 June 2024]

Chicago style

WikiPatents contributors, "18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18166750._SEMICONDUCTOR_DEVICE_STRUCTURE_WITH_GATE_DIELECTRIC_LAYER_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=52913 (accessed June 3, 2024).

CBE/CSE style

WikiPatents contributors. 18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Apr 15, 17:29 UTC [cited 2024 Jun 3]. Available from: http://wikipatents.org/index.php?title=18166750._SEMICONDUCTOR_DEVICE_STRUCTURE_WITH_GATE_DIELECTRIC_LAYER_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=52913.

Bluebook style

18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18166750._SEMICONDUCTOR_DEVICE_STRUCTURE_WITH_GATE_DIELECTRIC_LAYER_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=52913 (last visited June 3, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18166750._SEMICONDUCTOR_DEVICE_STRUCTURE_WITH_GATE_DIELECTRIC_LAYER_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=52913",
   note = "[Online; accessed 3-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18166750. SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18166750._SEMICONDUCTOR_DEVICE_STRUCTURE_WITH_GATE_DIELECTRIC_LAYER_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=52913}",
   note = "[Online; accessed 3-June-2024]"
 }


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