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Bibliographic details for 18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- Page name: 18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 22 March 2024 06:30 UTC
- Date retrieved: 2 June 2024 07:36 UTC
- Permanent URL: http://wikipatents.org/index.php?title=18368422._SEMICONDUCTOR_PROCESS_SYSTEM_AND_GAS_TREATMENT_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=41271
- Page Version ID: 41271
Citation styles for 18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.)
APA style
18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.). (2024, March 22). WikiPatents, . Retrieved 07:36, June 2, 2024 from http://wikipatents.org/index.php?title=18368422._SEMICONDUCTOR_PROCESS_SYSTEM_AND_GAS_TREATMENT_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=41271.
MLA style
"18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.)." WikiPatents, . 22 Mar 2024, 06:30 UTC. 2 Jun 2024, 07:36 <http://wikipatents.org/index.php?title=18368422._SEMICONDUCTOR_PROCESS_SYSTEM_AND_GAS_TREATMENT_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=41271>.
MHRA style
WikiPatents contributors, '18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.)', WikiPatents, , 22 March 2024, 06:30 UTC, <http://wikipatents.org/index.php?title=18368422._SEMICONDUCTOR_PROCESS_SYSTEM_AND_GAS_TREATMENT_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=41271> [accessed 2 June 2024]
Chicago style
WikiPatents contributors, "18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18368422._SEMICONDUCTOR_PROCESS_SYSTEM_AND_GAS_TREATMENT_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=41271 (accessed June 2, 2024).
CBE/CSE style
WikiPatents contributors. 18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.) [Internet]. WikiPatents, ; 2024 Mar 22, 06:30 UTC [cited 2024 Jun 2]. Available from: http://wikipatents.org/index.php?title=18368422._SEMICONDUCTOR_PROCESS_SYSTEM_AND_GAS_TREATMENT_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=41271.
Bluebook style
18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.), http://wikipatents.org/index.php?title=18368422._SEMICONDUCTOR_PROCESS_SYSTEM_AND_GAS_TREATMENT_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=41271 (last visited June 2, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "http://wikipatents.org/index.php?title=18368422._SEMICONDUCTOR_PROCESS_SYSTEM_AND_GAS_TREATMENT_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=41271",
note = "[Online; accessed 2-June-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "\url{http://wikipatents.org/index.php?title=18368422._SEMICONDUCTOR_PROCESS_SYSTEM_AND_GAS_TREATMENT_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=41271}",
note = "[Online; accessed 2-June-2024]"
}
