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Bibliographic details for Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract

Citation styles for Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract

APA style

Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract. (2024, March 21). WikiPatents, . Retrieved 15:01, June 8, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240099147)._FATIGUE-FREE_BIPOLAR_LOOP_TREATMENT_TO_REDUCE_IMPRINT_EFFECT_IN_PIEZOELECTRIC_DEVICE_simplified_abstract&oldid=40403.

MLA style

"Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract." WikiPatents, . 21 Mar 2024, 10:19 UTC. 8 Jun 2024, 15:01 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240099147)._FATIGUE-FREE_BIPOLAR_LOOP_TREATMENT_TO_REDUCE_IMPRINT_EFFECT_IN_PIEZOELECTRIC_DEVICE_simplified_abstract&oldid=40403>.

MHRA style

WikiPatents contributors, 'Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract', WikiPatents, , 21 March 2024, 10:19 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240099147)._FATIGUE-FREE_BIPOLAR_LOOP_TREATMENT_TO_REDUCE_IMPRINT_EFFECT_IN_PIEZOELECTRIC_DEVICE_simplified_abstract&oldid=40403> [accessed 8 June 2024]

Chicago style

WikiPatents contributors, "Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240099147)._FATIGUE-FREE_BIPOLAR_LOOP_TREATMENT_TO_REDUCE_IMPRINT_EFFECT_IN_PIEZOELECTRIC_DEVICE_simplified_abstract&oldid=40403 (accessed June 8, 2024).

CBE/CSE style

WikiPatents contributors. Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract [Internet]. WikiPatents, ; 2024 Mar 21, 10:19 UTC [cited 2024 Jun 8]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240099147)._FATIGUE-FREE_BIPOLAR_LOOP_TREATMENT_TO_REDUCE_IMPRINT_EFFECT_IN_PIEZOELECTRIC_DEVICE_simplified_abstract&oldid=40403.

Bluebook style

Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240099147)._FATIGUE-FREE_BIPOLAR_LOOP_TREATMENT_TO_REDUCE_IMPRINT_EFFECT_IN_PIEZOELECTRIC_DEVICE_simplified_abstract&oldid=40403 (last visited June 8, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240099147)._FATIGUE-FREE_BIPOLAR_LOOP_TREATMENT_TO_REDUCE_IMPRINT_EFFECT_IN_PIEZOELECTRIC_DEVICE_simplified_abstract&oldid=40403",
   note = "[Online; accessed 8-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240099147). FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240099147)._FATIGUE-FREE_BIPOLAR_LOOP_TREATMENT_TO_REDUCE_IMPRINT_EFFECT_IN_PIEZOELECTRIC_DEVICE_simplified_abstract&oldid=40403}",
   note = "[Online; accessed 8-June-2024]"
 }


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