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Bibliographic details for Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract

Citation styles for Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract

APA style

Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract. (2024, March 21). WikiPatents, . Retrieved 02:25, June 9, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240097039)._Crystallization_of_High-K_Dielectric_Layer_simplified_abstract&oldid=40391.

MLA style

"Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract." WikiPatents, . 21 Mar 2024, 10:17 UTC. 9 Jun 2024, 02:25 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240097039)._Crystallization_of_High-K_Dielectric_Layer_simplified_abstract&oldid=40391>.

MHRA style

WikiPatents contributors, 'Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract', WikiPatents, , 21 March 2024, 10:17 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240097039)._Crystallization_of_High-K_Dielectric_Layer_simplified_abstract&oldid=40391> [accessed 9 June 2024]

Chicago style

WikiPatents contributors, "Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240097039)._Crystallization_of_High-K_Dielectric_Layer_simplified_abstract&oldid=40391 (accessed June 9, 2024).

CBE/CSE style

WikiPatents contributors. Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract [Internet]. WikiPatents, ; 2024 Mar 21, 10:17 UTC [cited 2024 Jun 9]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240097039)._Crystallization_of_High-K_Dielectric_Layer_simplified_abstract&oldid=40391.

Bluebook style

Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240097039)._Crystallization_of_High-K_Dielectric_Layer_simplified_abstract&oldid=40391 (last visited June 9, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240097039)._Crystallization_of_High-K_Dielectric_Layer_simplified_abstract&oldid=40391",
   note = "[Online; accessed 9-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240097039). Crystallization of High-K Dielectric Layer simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240097039)._Crystallization_of_High-K_Dielectric_Layer_simplified_abstract&oldid=40391}",
   note = "[Online; accessed 9-June-2024]"
 }


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