Cite This Page

Jump to navigation Jump to search

Bibliographic details for Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract

Citation styles for Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract

APA style

Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract. (2024, March 21). WikiPatents, . Retrieved 22:52, May 28, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096867)._SEMICONDUCTOR_DEVICE_INCLUDING_SOURCE/DRAIN_CONTACT_HAVING_HEIGHT_BELOW_GATE_STACK_simplified_abstract&oldid=40351.

MLA style

"Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract." WikiPatents, . 21 Mar 2024, 10:11 UTC. 28 May 2024, 22:52 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096867)._SEMICONDUCTOR_DEVICE_INCLUDING_SOURCE/DRAIN_CONTACT_HAVING_HEIGHT_BELOW_GATE_STACK_simplified_abstract&oldid=40351>.

MHRA style

WikiPatents contributors, 'Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract', WikiPatents, , 21 March 2024, 10:11 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096867)._SEMICONDUCTOR_DEVICE_INCLUDING_SOURCE/DRAIN_CONTACT_HAVING_HEIGHT_BELOW_GATE_STACK_simplified_abstract&oldid=40351> [accessed 28 May 2024]

Chicago style

WikiPatents contributors, "Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096867)._SEMICONDUCTOR_DEVICE_INCLUDING_SOURCE/DRAIN_CONTACT_HAVING_HEIGHT_BELOW_GATE_STACK_simplified_abstract&oldid=40351 (accessed May 28, 2024).

CBE/CSE style

WikiPatents contributors. Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract [Internet]. WikiPatents, ; 2024 Mar 21, 10:11 UTC [cited 2024 May 28]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096867)._SEMICONDUCTOR_DEVICE_INCLUDING_SOURCE/DRAIN_CONTACT_HAVING_HEIGHT_BELOW_GATE_STACK_simplified_abstract&oldid=40351.

Bluebook style

Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096867)._SEMICONDUCTOR_DEVICE_INCLUDING_SOURCE/DRAIN_CONTACT_HAVING_HEIGHT_BELOW_GATE_STACK_simplified_abstract&oldid=40351 (last visited May 28, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096867)._SEMICONDUCTOR_DEVICE_INCLUDING_SOURCE/DRAIN_CONTACT_HAVING_HEIGHT_BELOW_GATE_STACK_simplified_abstract&oldid=40351",
   note = "[Online; accessed 28-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240096867). SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN CONTACT HAVING HEIGHT BELOW GATE STACK simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096867)._SEMICONDUCTOR_DEVICE_INCLUDING_SOURCE/DRAIN_CONTACT_HAVING_HEIGHT_BELOW_GATE_STACK_simplified_abstract&oldid=40351}",
   note = "[Online; accessed 28-May-2024]"
 }


Retrieved from "http://wikipatents.org/index.php?title=Special:CiteThisPage"