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Bibliographic details for Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract

Citation styles for Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract

APA style

Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract. (2024, March 21). WikiPatents, . Retrieved 02:38, May 29, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096642)._METAL_OXIDE_LAYERED_STRUCTURE_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=40309.

MLA style

"Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract." WikiPatents, . 21 Mar 2024, 10:06 UTC. 29 May 2024, 02:38 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096642)._METAL_OXIDE_LAYERED_STRUCTURE_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=40309>.

MHRA style

WikiPatents contributors, 'Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract', WikiPatents, , 21 March 2024, 10:06 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096642)._METAL_OXIDE_LAYERED_STRUCTURE_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=40309> [accessed 29 May 2024]

Chicago style

WikiPatents contributors, "Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096642)._METAL_OXIDE_LAYERED_STRUCTURE_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=40309 (accessed May 29, 2024).

CBE/CSE style

WikiPatents contributors. Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract [Internet]. WikiPatents, ; 2024 Mar 21, 10:06 UTC [cited 2024 May 29]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096642)._METAL_OXIDE_LAYERED_STRUCTURE_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=40309.

Bluebook style

Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096642)._METAL_OXIDE_LAYERED_STRUCTURE_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=40309 (last visited May 29, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096642)._METAL_OXIDE_LAYERED_STRUCTURE_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=40309",
   note = "[Online; accessed 29-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240096642). METAL OXIDE LAYERED STRUCTURE AND METHODS OF FORMING THE SAME simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240096642)._METAL_OXIDE_LAYERED_STRUCTURE_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=40309}",
   note = "[Online; accessed 29-May-2024]"
 }


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