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Bibliographic details for 18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- Page name: 18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 16 March 2024 23:56 UTC
- Date retrieved: 10 June 2024 01:57 UTC
- Permanent URL: http://wikipatents.org/index.php?title=18170933._ETCHING-DAMAGE-FREE_INTERMETAL_DIELECTRIC_LAYER_WITH_THERMAL_DISSIPATION_FEATURE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37392
- Page Version ID: 37392
Citation styles for 18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
APA style
18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, March 16). WikiPatents, . Retrieved 01:57, June 10, 2024 from http://wikipatents.org/index.php?title=18170933._ETCHING-DAMAGE-FREE_INTERMETAL_DIELECTRIC_LAYER_WITH_THERMAL_DISSIPATION_FEATURE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37392.
MLA style
"18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 16 Mar 2024, 23:56 UTC. 10 Jun 2024, 01:57 <http://wikipatents.org/index.php?title=18170933._ETCHING-DAMAGE-FREE_INTERMETAL_DIELECTRIC_LAYER_WITH_THERMAL_DISSIPATION_FEATURE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37392>.
MHRA style
WikiPatents contributors, '18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 16 March 2024, 23:56 UTC, <http://wikipatents.org/index.php?title=18170933._ETCHING-DAMAGE-FREE_INTERMETAL_DIELECTRIC_LAYER_WITH_THERMAL_DISSIPATION_FEATURE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37392> [accessed 10 June 2024]
Chicago style
WikiPatents contributors, "18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18170933._ETCHING-DAMAGE-FREE_INTERMETAL_DIELECTRIC_LAYER_WITH_THERMAL_DISSIPATION_FEATURE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37392 (accessed June 10, 2024).
CBE/CSE style
WikiPatents contributors. 18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Mar 16, 23:56 UTC [cited 2024 Jun 10]. Available from: http://wikipatents.org/index.php?title=18170933._ETCHING-DAMAGE-FREE_INTERMETAL_DIELECTRIC_LAYER_WITH_THERMAL_DISSIPATION_FEATURE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37392.
Bluebook style
18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18170933._ETCHING-DAMAGE-FREE_INTERMETAL_DIELECTRIC_LAYER_WITH_THERMAL_DISSIPATION_FEATURE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37392 (last visited June 10, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=18170933._ETCHING-DAMAGE-FREE_INTERMETAL_DIELECTRIC_LAYER_WITH_THERMAL_DISSIPATION_FEATURE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37392", note = "[Online; accessed 10-June-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "18170933. ETCHING-DAMAGE-FREE INTERMETAL DIELECTRIC LAYER WITH THERMAL DISSIPATION FEATURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=18170933._ETCHING-DAMAGE-FREE_INTERMETAL_DIELECTRIC_LAYER_WITH_THERMAL_DISSIPATION_FEATURE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37392}", note = "[Online; accessed 10-June-2024]" }