Cite This Page

Citation styles for 17885809. APPARATUS AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

APA style

17885809. APPARATUS AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.). (2024, February 20). WikiPatents, . Retrieved 23:52, May 28, 2024 from http://wikipatents.org/index.php?title=17885809._APPARATUS_AND_METHOD_FOR_MONITORING_CHEMICAL_MECHANICAL_POLISHING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=35095.

MLA style

"17885809. APPARATUS AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)." WikiPatents, . 20 Feb 2024, 06:01 UTC. 28 May 2024, 23:52 <http://wikipatents.org/index.php?title=17885809._APPARATUS_AND_METHOD_FOR_MONITORING_CHEMICAL_MECHANICAL_POLISHING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=35095>.

MHRA style

WikiPatents contributors, '17885809. APPARATUS AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)', WikiPatents, , 20 February 2024, 06:01 UTC, <http://wikipatents.org/index.php?title=17885809._APPARATUS_AND_METHOD_FOR_MONITORING_CHEMICAL_MECHANICAL_POLISHING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=35095> [accessed 28 May 2024]

Chicago style

WikiPatents contributors, "17885809. APPARATUS AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=17885809._APPARATUS_AND_METHOD_FOR_MONITORING_CHEMICAL_MECHANICAL_POLISHING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=35095 (accessed May 28, 2024).

CBE/CSE style

WikiPatents contributors. 17885809. APPARATUS AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) [Internet]. WikiPatents, ; 2024 Feb 20, 06:01 UTC [cited 2024 May 28]. Available from: http://wikipatents.org/index.php?title=17885809._APPARATUS_AND_METHOD_FOR_MONITORING_CHEMICAL_MECHANICAL_POLISHING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=35095.

Bluebook style

17885809. APPARATUS AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.), http://wikipatents.org/index.php?title=17885809._APPARATUS_AND_METHOD_FOR_MONITORING_CHEMICAL_MECHANICAL_POLISHING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=35095 (last visited May 28, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17885809. APPARATUS AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=17885809._APPARATUS_AND_METHOD_FOR_MONITORING_CHEMICAL_MECHANICAL_POLISHING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=35095",
   note = "[Online; accessed 28-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17885809. APPARATUS AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=17885809._APPARATUS_AND_METHOD_FOR_MONITORING_CHEMICAL_MECHANICAL_POLISHING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=35095}",
   note = "[Online; accessed 28-May-2024]"
 }