Cite This Page
Bibliographic details for 20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited)
- Page name: 20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 9 February 2024 03:44 UTC
- Date retrieved: 23 May 2024 19:58 UTC
- Permanent URL: http://wikipatents.org/index.php?title=20240047210._DOUBLE_HARDMASKS_FOR_SELF-ALIGNED_MULTI-PATTERNING_PROCESSES_simplified_abstract_(Tokyo_Electron_Limited)&oldid=32815
- Page Version ID: 32815
Citation styles for 20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited)
APA style
20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited). (2024, February 9). WikiPatents, . Retrieved 19:58, May 23, 2024 from http://wikipatents.org/index.php?title=20240047210._DOUBLE_HARDMASKS_FOR_SELF-ALIGNED_MULTI-PATTERNING_PROCESSES_simplified_abstract_(Tokyo_Electron_Limited)&oldid=32815.
MLA style
"20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited)." WikiPatents, . 9 Feb 2024, 03:44 UTC. 23 May 2024, 19:58 <http://wikipatents.org/index.php?title=20240047210._DOUBLE_HARDMASKS_FOR_SELF-ALIGNED_MULTI-PATTERNING_PROCESSES_simplified_abstract_(Tokyo_Electron_Limited)&oldid=32815>.
MHRA style
WikiPatents contributors, '20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited)', WikiPatents, , 9 February 2024, 03:44 UTC, <http://wikipatents.org/index.php?title=20240047210._DOUBLE_HARDMASKS_FOR_SELF-ALIGNED_MULTI-PATTERNING_PROCESSES_simplified_abstract_(Tokyo_Electron_Limited)&oldid=32815> [accessed 23 May 2024]
Chicago style
WikiPatents contributors, "20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited)," WikiPatents, , http://wikipatents.org/index.php?title=20240047210._DOUBLE_HARDMASKS_FOR_SELF-ALIGNED_MULTI-PATTERNING_PROCESSES_simplified_abstract_(Tokyo_Electron_Limited)&oldid=32815 (accessed May 23, 2024).
CBE/CSE style
WikiPatents contributors. 20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited) [Internet]. WikiPatents, ; 2024 Feb 9, 03:44 UTC [cited 2024 May 23]. Available from: http://wikipatents.org/index.php?title=20240047210._DOUBLE_HARDMASKS_FOR_SELF-ALIGNED_MULTI-PATTERNING_PROCESSES_simplified_abstract_(Tokyo_Electron_Limited)&oldid=32815.
Bluebook style
20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited), http://wikipatents.org/index.php?title=20240047210._DOUBLE_HARDMASKS_FOR_SELF-ALIGNED_MULTI-PATTERNING_PROCESSES_simplified_abstract_(Tokyo_Electron_Limited)&oldid=32815 (last visited May 23, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited) --- WikiPatents{,} ",
year = "2024",
url = "http://wikipatents.org/index.php?title=20240047210._DOUBLE_HARDMASKS_FOR_SELF-ALIGNED_MULTI-PATTERNING_PROCESSES_simplified_abstract_(Tokyo_Electron_Limited)&oldid=32815",
note = "[Online; accessed 23-May-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "20240047210. DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES simplified abstract (Tokyo Electron Limited) --- WikiPatents{,} ",
year = "2024",
url = "\url{http://wikipatents.org/index.php?title=20240047210._DOUBLE_HARDMASKS_FOR_SELF-ALIGNED_MULTI-PATTERNING_PROCESSES_simplified_abstract_(Tokyo_Electron_Limited)&oldid=32815}",
note = "[Online; accessed 23-May-2024]"
}
