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Bibliographic details for 20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited)
- Page name: 20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 19 January 2024 10:29 UTC
- Date retrieved: 7 June 2024 04:10 UTC
- Permanent URL: http://wikipatents.org/index.php?title=20240021601._BCD_DEVICE_LAYOUT_AREA_DEFINED_BY_A_DEEP_TRENCH_ISOLATION_STRUCTURE_AND_METHODS_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company_Limited)&oldid=28681
- Page Version ID: 28681
Citation styles for 20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited)
APA style
20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited). (2024, January 19). WikiPatents, . Retrieved 04:10, June 7, 2024 from http://wikipatents.org/index.php?title=20240021601._BCD_DEVICE_LAYOUT_AREA_DEFINED_BY_A_DEEP_TRENCH_ISOLATION_STRUCTURE_AND_METHODS_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company_Limited)&oldid=28681.
MLA style
"20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited)." WikiPatents, . 19 Jan 2024, 10:29 UTC. 7 Jun 2024, 04:10 <http://wikipatents.org/index.php?title=20240021601._BCD_DEVICE_LAYOUT_AREA_DEFINED_BY_A_DEEP_TRENCH_ISOLATION_STRUCTURE_AND_METHODS_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company_Limited)&oldid=28681>.
MHRA style
WikiPatents contributors, '20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited)', WikiPatents, , 19 January 2024, 10:29 UTC, <http://wikipatents.org/index.php?title=20240021601._BCD_DEVICE_LAYOUT_AREA_DEFINED_BY_A_DEEP_TRENCH_ISOLATION_STRUCTURE_AND_METHODS_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company_Limited)&oldid=28681> [accessed 7 June 2024]
Chicago style
WikiPatents contributors, "20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited)," WikiPatents, , http://wikipatents.org/index.php?title=20240021601._BCD_DEVICE_LAYOUT_AREA_DEFINED_BY_A_DEEP_TRENCH_ISOLATION_STRUCTURE_AND_METHODS_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company_Limited)&oldid=28681 (accessed June 7, 2024).
CBE/CSE style
WikiPatents contributors. 20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited) [Internet]. WikiPatents, ; 2024 Jan 19, 10:29 UTC [cited 2024 Jun 7]. Available from: http://wikipatents.org/index.php?title=20240021601._BCD_DEVICE_LAYOUT_AREA_DEFINED_BY_A_DEEP_TRENCH_ISOLATION_STRUCTURE_AND_METHODS_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company_Limited)&oldid=28681.
Bluebook style
20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited), http://wikipatents.org/index.php?title=20240021601._BCD_DEVICE_LAYOUT_AREA_DEFINED_BY_A_DEEP_TRENCH_ISOLATION_STRUCTURE_AND_METHODS_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company_Limited)&oldid=28681 (last visited June 7, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited) --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=20240021601._BCD_DEVICE_LAYOUT_AREA_DEFINED_BY_A_DEEP_TRENCH_ISOLATION_STRUCTURE_AND_METHODS_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company_Limited)&oldid=28681", note = "[Online; accessed 7-June-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "20240021601. BCD DEVICE LAYOUT AREA DEFINED BY A DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company Limited) --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=20240021601._BCD_DEVICE_LAYOUT_AREA_DEFINED_BY_A_DEEP_TRENCH_ISOLATION_STRUCTURE_AND_METHODS_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company_Limited)&oldid=28681}", note = "[Online; accessed 7-June-2024]" }