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Bibliographic details for 18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- Page name: 18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 4 January 2024 06:07 UTC
- Date retrieved: 9 June 2024 23:29 UTC
- Permanent URL: http://wikipatents.org/index.php?title=18062502._METHOD_OF_FORMING_LOW-RESISTIVITY_RU_ALD_THROUGH_A_BI-LAYER_PROCESS_AND_RELATED_STRUCTURES_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=25464
- Page Version ID: 25464
Citation styles for 18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
APA style
18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.). (2024, January 4). WikiPatents, . Retrieved 23:29, June 9, 2024 from http://wikipatents.org/index.php?title=18062502._METHOD_OF_FORMING_LOW-RESISTIVITY_RU_ALD_THROUGH_A_BI-LAYER_PROCESS_AND_RELATED_STRUCTURES_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=25464.
MLA style
"18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)." WikiPatents, . 4 Jan 2024, 06:07 UTC. 9 Jun 2024, 23:29 <http://wikipatents.org/index.php?title=18062502._METHOD_OF_FORMING_LOW-RESISTIVITY_RU_ALD_THROUGH_A_BI-LAYER_PROCESS_AND_RELATED_STRUCTURES_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=25464>.
MHRA style
WikiPatents contributors, '18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)', WikiPatents, , 4 January 2024, 06:07 UTC, <http://wikipatents.org/index.php?title=18062502._METHOD_OF_FORMING_LOW-RESISTIVITY_RU_ALD_THROUGH_A_BI-LAYER_PROCESS_AND_RELATED_STRUCTURES_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=25464> [accessed 9 June 2024]
Chicago style
WikiPatents contributors, "18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=18062502._METHOD_OF_FORMING_LOW-RESISTIVITY_RU_ALD_THROUGH_A_BI-LAYER_PROCESS_AND_RELATED_STRUCTURES_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=25464 (accessed June 9, 2024).
CBE/CSE style
WikiPatents contributors. 18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) [Internet]. WikiPatents, ; 2024 Jan 4, 06:07 UTC [cited 2024 Jun 9]. Available from: http://wikipatents.org/index.php?title=18062502._METHOD_OF_FORMING_LOW-RESISTIVITY_RU_ALD_THROUGH_A_BI-LAYER_PROCESS_AND_RELATED_STRUCTURES_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=25464.
Bluebook style
18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.), http://wikipatents.org/index.php?title=18062502._METHOD_OF_FORMING_LOW-RESISTIVITY_RU_ALD_THROUGH_A_BI-LAYER_PROCESS_AND_RELATED_STRUCTURES_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=25464 (last visited June 9, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=18062502._METHOD_OF_FORMING_LOW-RESISTIVITY_RU_ALD_THROUGH_A_BI-LAYER_PROCESS_AND_RELATED_STRUCTURES_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=25464", note = "[Online; accessed 9-June-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "18062502. METHOD OF FORMING LOW-RESISTIVITY RU ALD THROUGH A BI-LAYER PROCESS AND RELATED STRUCTURES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=18062502._METHOD_OF_FORMING_LOW-RESISTIVITY_RU_ALD_THROUGH_A_BI-LAYER_PROCESS_AND_RELATED_STRUCTURES_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=25464}", note = "[Online; accessed 9-June-2024]" }