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Bibliographic details for 18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- Page name: 18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 4 January 2024 02:02 UTC
- Date retrieved: 28 May 2024 18:43 UTC
- Permanent URL: http://wikipatents.org/index.php?title=18157352._Method_and_Structure_for_FinFET_Isolation_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23621
- Page Version ID: 23621
Citation styles for 18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
APA style
18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.). (2024, January 4). WikiPatents, . Retrieved 18:43, May 28, 2024 from http://wikipatents.org/index.php?title=18157352._Method_and_Structure_for_FinFET_Isolation_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23621.
MLA style
"18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)." WikiPatents, . 4 Jan 2024, 02:02 UTC. 28 May 2024, 18:43 <http://wikipatents.org/index.php?title=18157352._Method_and_Structure_for_FinFET_Isolation_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23621>.
MHRA style
WikiPatents contributors, '18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)', WikiPatents, , 4 January 2024, 02:02 UTC, <http://wikipatents.org/index.php?title=18157352._Method_and_Structure_for_FinFET_Isolation_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23621> [accessed 28 May 2024]
Chicago style
WikiPatents contributors, "18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18157352._Method_and_Structure_for_FinFET_Isolation_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23621 (accessed May 28, 2024).
CBE/CSE style
WikiPatents contributors. 18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) [Internet]. WikiPatents, ; 2024 Jan 4, 02:02 UTC [cited 2024 May 28]. Available from: http://wikipatents.org/index.php?title=18157352._Method_and_Structure_for_FinFET_Isolation_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23621.
Bluebook style
18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.), http://wikipatents.org/index.php?title=18157352._Method_and_Structure_for_FinFET_Isolation_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23621 (last visited May 28, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "http://wikipatents.org/index.php?title=18157352._Method_and_Structure_for_FinFET_Isolation_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23621",
note = "[Online; accessed 28-May-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "18157352. Method and Structure for FinFET Isolation simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "\url{http://wikipatents.org/index.php?title=18157352._Method_and_Structure_for_FinFET_Isolation_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23621}",
note = "[Online; accessed 28-May-2024]"
}
