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Bibliographic details for 17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

Citation styles for 17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

APA style

17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.). (2024, January 2). WikiPatents, . Retrieved 06:37, June 3, 2024 from http://wikipatents.org/index.php?title=17939153._ADDITIVE_FOR_PHOTORESIST,_PHOTORESIST_COMPOSITION_FOR_EUV_INCLUDING_THE_SAME,_AND_METHOD_FOR_MANUFACTURING_SEMICONDUCTOR_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20453.

MLA style

"17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)." WikiPatents, . 2 Jan 2024, 05:24 UTC. 3 Jun 2024, 06:37 <http://wikipatents.org/index.php?title=17939153._ADDITIVE_FOR_PHOTORESIST,_PHOTORESIST_COMPOSITION_FOR_EUV_INCLUDING_THE_SAME,_AND_METHOD_FOR_MANUFACTURING_SEMICONDUCTOR_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20453>.

MHRA style

WikiPatents contributors, '17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)', WikiPatents, , 2 January 2024, 05:24 UTC, <http://wikipatents.org/index.php?title=17939153._ADDITIVE_FOR_PHOTORESIST,_PHOTORESIST_COMPOSITION_FOR_EUV_INCLUDING_THE_SAME,_AND_METHOD_FOR_MANUFACTURING_SEMICONDUCTOR_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20453> [accessed 3 June 2024]

Chicago style

WikiPatents contributors, "17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=17939153._ADDITIVE_FOR_PHOTORESIST,_PHOTORESIST_COMPOSITION_FOR_EUV_INCLUDING_THE_SAME,_AND_METHOD_FOR_MANUFACTURING_SEMICONDUCTOR_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20453 (accessed June 3, 2024).

CBE/CSE style

WikiPatents contributors. 17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) [Internet]. WikiPatents, ; 2024 Jan 2, 05:24 UTC [cited 2024 Jun 3]. Available from: http://wikipatents.org/index.php?title=17939153._ADDITIVE_FOR_PHOTORESIST,_PHOTORESIST_COMPOSITION_FOR_EUV_INCLUDING_THE_SAME,_AND_METHOD_FOR_MANUFACTURING_SEMICONDUCTOR_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20453.

Bluebook style

17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.), http://wikipatents.org/index.php?title=17939153._ADDITIVE_FOR_PHOTORESIST,_PHOTORESIST_COMPOSITION_FOR_EUV_INCLUDING_THE_SAME,_AND_METHOD_FOR_MANUFACTURING_SEMICONDUCTOR_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20453 (last visited June 3, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=17939153._ADDITIVE_FOR_PHOTORESIST,_PHOTORESIST_COMPOSITION_FOR_EUV_INCLUDING_THE_SAME,_AND_METHOD_FOR_MANUFACTURING_SEMICONDUCTOR_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20453",
   note = "[Online; accessed 3-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=17939153._ADDITIVE_FOR_PHOTORESIST,_PHOTORESIST_COMPOSITION_FOR_EUV_INCLUDING_THE_SAME,_AND_METHOD_FOR_MANUFACTURING_SEMICONDUCTOR_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20453}",
   note = "[Online; accessed 3-June-2024]"
 }


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