Cite This Page

Citation styles for 17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

APA style

17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.). (2024, January 2). WikiPatents, . Retrieved 20:03, May 28, 2024 from http://wikipatents.org/index.php?title=17585942._METHODS_AND_SYSTEMS_FOR_INTEGRATED_CIRCUIT_PHOTOMASK_PATTERNING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19534.

MLA style

"17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)." WikiPatents, . 2 Jan 2024, 02:59 UTC. 28 May 2024, 20:03 <http://wikipatents.org/index.php?title=17585942._METHODS_AND_SYSTEMS_FOR_INTEGRATED_CIRCUIT_PHOTOMASK_PATTERNING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19534>.

MHRA style

WikiPatents contributors, '17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)', WikiPatents, , 2 January 2024, 02:59 UTC, <http://wikipatents.org/index.php?title=17585942._METHODS_AND_SYSTEMS_FOR_INTEGRATED_CIRCUIT_PHOTOMASK_PATTERNING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19534> [accessed 28 May 2024]

Chicago style

WikiPatents contributors, "17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=17585942._METHODS_AND_SYSTEMS_FOR_INTEGRATED_CIRCUIT_PHOTOMASK_PATTERNING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19534 (accessed May 28, 2024).

CBE/CSE style

WikiPatents contributors. 17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) [Internet]. WikiPatents, ; 2024 Jan 2, 02:59 UTC [cited 2024 May 28]. Available from: http://wikipatents.org/index.php?title=17585942._METHODS_AND_SYSTEMS_FOR_INTEGRATED_CIRCUIT_PHOTOMASK_PATTERNING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19534.

Bluebook style

17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.), http://wikipatents.org/index.php?title=17585942._METHODS_AND_SYSTEMS_FOR_INTEGRATED_CIRCUIT_PHOTOMASK_PATTERNING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19534 (last visited May 28, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=17585942._METHODS_AND_SYSTEMS_FOR_INTEGRATED_CIRCUIT_PHOTOMASK_PATTERNING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19534",
   note = "[Online; accessed 28-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=17585942._METHODS_AND_SYSTEMS_FOR_INTEGRATED_CIRCUIT_PHOTOMASK_PATTERNING_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19534}",
   note = "[Online; accessed 28-May-2024]"
 }