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Bibliographic details for 17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- Page name: 17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 2 January 2024 02:55 UTC
- Date retrieved: 28 May 2024 18:34 UTC
- Permanent URL: http://wikipatents.org/index.php?title=17568176._CRITICAL_DIMENSION_UNIFORMITY_(CDU)_CONTROL_METHOD_AND_SEMICONDUCTOR_SUBSTRATE_PROCESSING_SYSTEM_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19494
- Page Version ID: 19494
Citation styles for 17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
APA style
17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.). (2024, January 2). WikiPatents, . Retrieved 18:34, May 28, 2024 from http://wikipatents.org/index.php?title=17568176._CRITICAL_DIMENSION_UNIFORMITY_(CDU)_CONTROL_METHOD_AND_SEMICONDUCTOR_SUBSTRATE_PROCESSING_SYSTEM_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19494.
MLA style
"17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)." WikiPatents, . 2 Jan 2024, 02:55 UTC. 28 May 2024, 18:34 <http://wikipatents.org/index.php?title=17568176._CRITICAL_DIMENSION_UNIFORMITY_(CDU)_CONTROL_METHOD_AND_SEMICONDUCTOR_SUBSTRATE_PROCESSING_SYSTEM_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19494>.
MHRA style
WikiPatents contributors, '17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)', WikiPatents, , 2 January 2024, 02:55 UTC, <http://wikipatents.org/index.php?title=17568176._CRITICAL_DIMENSION_UNIFORMITY_(CDU)_CONTROL_METHOD_AND_SEMICONDUCTOR_SUBSTRATE_PROCESSING_SYSTEM_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19494> [accessed 28 May 2024]
Chicago style
WikiPatents contributors, "17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=17568176._CRITICAL_DIMENSION_UNIFORMITY_(CDU)_CONTROL_METHOD_AND_SEMICONDUCTOR_SUBSTRATE_PROCESSING_SYSTEM_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19494 (accessed May 28, 2024).
CBE/CSE style
WikiPatents contributors. 17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) [Internet]. WikiPatents, ; 2024 Jan 2, 02:55 UTC [cited 2024 May 28]. Available from: http://wikipatents.org/index.php?title=17568176._CRITICAL_DIMENSION_UNIFORMITY_(CDU)_CONTROL_METHOD_AND_SEMICONDUCTOR_SUBSTRATE_PROCESSING_SYSTEM_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19494.
Bluebook style
17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.), http://wikipatents.org/index.php?title=17568176._CRITICAL_DIMENSION_UNIFORMITY_(CDU)_CONTROL_METHOD_AND_SEMICONDUCTOR_SUBSTRATE_PROCESSING_SYSTEM_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19494 (last visited May 28, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=17568176._CRITICAL_DIMENSION_UNIFORMITY_(CDU)_CONTROL_METHOD_AND_SEMICONDUCTOR_SUBSTRATE_PROCESSING_SYSTEM_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19494", note = "[Online; accessed 28-May-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "17568176. CRITICAL DIMENSION UNIFORMITY (CDU) CONTROL METHOD AND SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=17568176._CRITICAL_DIMENSION_UNIFORMITY_(CDU)_CONTROL_METHOD_AND_SEMICONDUCTOR_SUBSTRATE_PROCESSING_SYSTEM_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19494}", note = "[Online; accessed 28-May-2024]" }